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Volumn 52, Issue 2, 2013, Pages

Fabrication of visible-light-transparent solar cells using p-type nio films by low oxygen fraction reactive rf sputtering deposition

(6) Warasawa, Moe a Watanabe, Yousuke a Ishida, Jun a Murata, Yoshitsuna a Chichibu, Shigefusa F b Sugiyama, Mutsumi a

a TOKYO UNIVERSITY OF SCIENCE (Japan)

b TOHOKU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION CONDITIONS; FORMATION ENERGIES; GASPHASE; LOW OXYGEN; N-TYPE ZNO; OXYGEN-POOR; P-N JUNCTION; P-TYPE NIO; REACTIVE RF SPUTTERING; WAVELENGTH RANGES;

DEPOSITS; PHOTOVOLTAIC EFFECTS; ZINC OXIDE;

OXYGEN;

EID: 84874150621 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.7567/JJAP.52.021102 Document Type: Article

Times cited : (58)

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