Transparent p-type conducting K-doped NiO films deposited by pulsed plasma deposition

Thin Solid Films

Volumn 520, Issue 18, 2012, Pages 5884-5888

  Yang, Ming ^a   Pu, Haifeng ^a   Zhou, Qianfei ^a   Zhang, Qun ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

Doping; K doped NiO; Nickel oxide; Potassium; Pulsed plasma deposition; TCO; Transparent conducting oxide

Indexed keywords

ATOMIC FORCE MICROSCOPE (AFM); ELECTRICAL AND OPTICAL PROPERTIES; FILM PROPERTIES; HALL MEASUREMENTS; K-DOPED; K-DOPING; NIO FILMS; NIO THIN FILM; P-TYPE; PULSED PLASMA DEPOSITION; ROOM TEMPERATURE; SUBSTRATE TEMPERATURE; TCO; TRANSPARENT CONDUCTING OXIDE; VISIBLE LIGHT REGION;

ATOMIC FORCE MICROSCOPY; CONDUCTIVE FILMS; DOPING (ADDITIVES); ELECTRIC PROPERTIES; NICKEL OXIDE; OPTICAL PROPERTIES; PHOTOELECTRONS; PLASMA DEPOSITION; POTASSIUM; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTOR DOPING;

EID: 84862221689     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.05.005     Document Type: Article

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