|
Volumn 6, Issue 5, 2009, Pages 1105-1108
|
Fabrication of a n-type ZnO/p-type Cu-Al-O heterojunction diode by sputtering deposition methods
|
Author keywords
[No Author keywords available]
|
Indexed keywords
DEPOSITION METHODS;
FORWARD VOLTAGE;
HETEROJUNCTION DIODES;
NEAR INFRARED REGION;
P-TYPE;
PLASMA SPUTTERING;
POLYCRYSTALLINE FILM;
RF SPUTTERING METHOD;
SPUTTERING DEPOSITION;
TRANSPARENT CONDUCTING OXIDE FILMS;
ZNO FILMS;
ALUMINUM;
CURRENT VOLTAGE CHARACTERISTICS;
DISTILLATION;
HETEROJUNCTIONS;
SEMICONDUCTOR DIODES;
ZINC OXIDE;
COPPER;
|
EID: 70349432647
PISSN: 18626351
EISSN: None
Source Type: Journal
DOI: 10.1002/pssc.200881167 Document Type: Conference Paper |
Times cited : (15)
|
References (18)
|