Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition

Physica Status Solidi (A) Applications and Materials Science

Volumn 210, Issue 2, 2013, Pages 276-284

  Lee, Jaesang ^a   Lee, Seung Jae ^a   Han, Won Bae ^a   Jeon, Heeyoung ^a   Park, Jingyu ^a   Jang, Woochool ^a   Yoon, Chong Seung ^a   Jeon, Hyeongtag ^a  

^a Hanyang University   (South Korea)

Author keywords

atomic layer deposition; crystal structure; grain size; thin films; titanium dioxide

Indexed keywords

AMORPHOUS TIO; ANATASE PHASE; ANATASE STRUCTURES; DEPOSITION TEMPERATURES; GRAIN SIZE; LARGE GRAIN SIZES; POLYCRYSTALLINE; POST-DEPOSITION; PRIMARY NUCLEATION; PROCESS WINDOW; RUTILE PHASIS; RUTILE STRUCTURE; RUTILE TRANSFORMATION; THERMAL-ANNEALING; TIO; TITANIUM OXIDE THIN FILMS;

AMORPHOUS MATERIALS; ANNEALING; ATOMIC LAYER DEPOSITION; CRYSTAL STRUCTURE; DEPOSITS; FILM GROWTH; GRAIN GROWTH; GRAIN SIZE AND SHAPE; OXIDE MINERALS; THIN FILMS; VAPOR DEPOSITION;

TITANIUM DIOXIDE;

EID: 84874078236     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201228671     Document Type: Article

References (37)

1. J.-Z. Chen, W.-Y. Ko, Y.-C. Yen, P. H. Chen, and, K.-J. Lin, ACS Nano 6, 6633 (2012).
2. C. E. Kim, and, I. Yun, Appl. Surf. Sci. 258, 3089 (2012).
3. Q. Wu, and, R. V. D. Krol, J. Am. Chem. Soc. 134, 9369 (2012).
4. H. Kim, G. P. Kushto, C. B. Arnold, Z. H. Kafafi, and, A. Pique, Appl. Phys. Lett. 85, 464 (2004).
5. L. Robben, A. A. Ismail, S. J. Lohmeier, A. Feldhoff, D. W. Bahnemann, and, J.-C. Buhl, Chem. Mater. 24, 1268 (2012).
6. D. Dambournet, I. Belharouak, and, K. Amine, Chem. Mater. 22, 1173 (2010).
7. S. K. Kim, G.-J. Choi, S. Y. Lee, M. Seo, S. W. Lee, J. H. Han, H.-S. Ahn, S. Han, and, C. S. Hwang, Adv. Mater. 20, 1429 (2008).
8. G. Liu, C. Sun, H. G. Yang, S. C. Smith, L. Wang, G. Q. Lu, and, H.-M. Cheng, Chem. Commun. 46, 755 (2010).
9. N. Wu, J. Wang, D. N. Tafen, H. Wang, J.-G. Zheng, J. P. Lewis, X. Liu, S. S. Leonard, and, A. Manivannan, J. Am. Chem. Soc. 132, 6679 (2010).
10. N. Li, G. Liu, C. Zhen, F. Li, L. Zhang, and, H.-M. Cheng, Adv. Funct. Mater. 21, 1717 (2011).
11. R. Long, and, N. J. English, J. Phys. Chem. C 113, 8373 (2009).
12. J. S. Chen, Y. L. Tan, C. M. Li, Y. L. Cheah, D. Luan, S. Madhavi, F. Y. C. Boey, L. A. Archer, and, X. W. Lou, J. Am. Chem. Soc. 132, 6124 (2010).
13. N. T. Nolan, M. K. Seery, and, S. C. Pillai, J. Phys. Chem. C 113, 16151 (2009).
14. L.-B. Di, X.-S. Li, C. Shi, Y. Xu, D.-Z. Zhao, and, A.-M. Zhu, J. Phys. D: Appl. Phys. 42, 032001 (2009).
15. A. Amin, D. Kohl, and, M. Wuttig, J. Phys. D: Appl. Phys. 43, 405303 (2010).
16. H. Shin, D. K. Jeong, J. Lee, M. M. Sung, J. Kim, and, J. Young, Adv. Mater. 16, 1197 (2004).
17. D. M. King, X. Du, A. S. Cavanagh, and, A. W. Weimer, Nanotechnology 19, 445401 (2008).
18. M. Tallarida, D. Friedrich, M. Stadter, M. Michling, and, D. Schmeisser, J. Nanosci. Nanotechnol. 11, 8049 (2011).
19. H. Jeon, and, Y. Won, Appl. Phys. Lett. 93, 124104 (2008).
20. A. Rahtu, and, M. Ritala, Chem. Vap. Deposition 8, 21 (2002).
21. S. K. Kim, W. Kim, K. Kim, C. S. Hwang, and, J. Jeong, Appl. Phys. Lett. 85, 4112 (2004).
22. J. W. Lim, S. J. Yun, and, J. Lee, Electrochem. Solid-State Lett. 7, F73 (2004).
23. J. F. Moulder, W. F. Stickle, P. E. Sobol, and, K. D. Bomben, (eds.), Handbook of X-ray Photoelectron Spectroscopy; A Reference Book of Standard Spectra for Identification and Interpretation of XPS Data (Physical Electronics Inc., Minnesota, 1995), p. 73.
24. P. Stefanov, M. Shipochka, P. Stefchev, Z. Raicheva, V. Lazarova, and, L. Spassov, J. Phys.: Conf. Ser. 100, 012039 (2008).
25. S. Monti, V. Carravetta, C. Battocchio, G. Iucci, and, G. Polzonetti, Langmuir 24, 3205 (2008).
26. A. Iwabuchi, C. Choo, and, K. Tanaka, J. Phys. Chem. B 108, 10863 (2004).
27. E. McCafferty, and, J. P. Wightman, Surf. Interface Anal. 26, 549 (1998).
28. E. Fisicaro, M. Visca, F. Garbassi, and, E. M. Ceresa, J. Phys. Chem. 74, 4160 (1970).
29. R. Sanjines, H. Tang, F. Berger, F. Gozzo, G. Margaritonto, and, F. Levy, J. Appl. Phys. 75, 2945 (1994).
30. G. N. Riakar, J. C. Gregory, J. L. Ong, L. C. Lucas, J. E. Lemons, D. Kawahara, and, M. Nakamura, J. Vac. Sci. Technol. 13, 2633 (1995).
31. W. Yang, and, C. A. Wolden, Thin Solid Films 515, 1708 (2006).
32. T. Morimoto, M. Nagao, and, F. Tokuda, J. Phys. Chem. 73, 243 (1969).
33. P. M. Kumar, S. Badrinarayanan, and, M. Sastry, Thin Solid Films 358, 122 (2000).
34. M. A. Henderson, Surf. Sci. Rep. 46, 1 (2002).
35. R. Hilfer, and, P. Meakin, Z. Phys. B 88, 223-2229 (1992).
36. H. Zhang, and, J. F. Banfield, Am. Mineral. 84, 528 (1999).
37. H. Zhang, and, J. F. Banfield, J. Mater. Res. 15, 437 (2000).