Growth of TiO 2 with thermal and plasma enhanced atomic layer deposition

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 9, 2011, Pages 8049-8053

  Tallarida, Massimo ^a   Friedrich, Daniel ^a   Städter, Matthias ^a   Michling, Marcel ^a   Schmeisser, Dieter ^a  

^a BRANDENBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

AFM; Atomic layer deposition; PE ALD; Photoemission spectroscopy; TiO 2; X ray absorption spectroscopy

Indexed keywords

AFM; AFM IMAGE; ATOMIC LAYER; COMPARATIVE STUDIES; CRYSTALLINE PHASE; CRYSTALLINE PHASIS; PE-ALD; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; STRUCTURAL CHANGE; TIO;

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; CRYSTALLITES; OXIDE MINERALS; PHOTOELECTRON SPECTROSCOPY; X RAY ABSORPTION SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

TITANIUM DIOXIDE;

EID: 84856898772     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.5102     Document Type: Conference Paper

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