Electrical properties and thermal stability of Pd-doped copper nitride films

Journal of Applied Physics

Volumn 113, Issue 4, 2013, Pages

  Ji, A L ^a   Lu, N P ^a   Gao, L ^a   Zhang, W B ^a   Liao, L G ^a   Cao, Z X ^a  

^a INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER NITRIDE; CU ATOMS; DECOMPOSITION PRODUCTS; ELECTRICAL RESISTIVITY; FOUR-ORDER; IN-VACUUM; METAL TARGET; METALLIC BEHAVIORS; METALLIC STRUCTURES; PD ATOMS; REACTIVE MAGNETRON SPUTTERING; THREE ORDERS OF MAGNITUDE; UNIT CELLS; XRD;

COPPER; DEPOSITS; ELECTRIC CONDUCTIVITY; THERMODYNAMIC STABILITY;

PALLADIUM;

EID: 84873693704     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4788905     Document Type: Article

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