메뉴 건너뛰기




Volumn 528, Issue , 2013, Pages 57-60

Investigating the degradation behavior under hot carrier stress for InGaZnO TFTs with symmetric and asymmetric structures

Author keywords

Hot carrier; Indium gallium zinc oxide (IGZO); Kick back effect; Thin film transistors (TFTs)

Indexed keywords

ASYMMETRIC STRUCTURES; C-V CURVE; C-V MEASUREMENT; DEGRADATION BEHAVIOR; DIFFERENT MECHANISMS; ELECTRICAL FIELD; GATE-TO-DRAIN CAPACITANCE; HOT CARRIER EFFECT; HOT-CARRIER STRESS; IN-CHANNELS; INDIUM GALLIUM ZINC OXIDES; IV CHARACTERIZATION; KICK-BACK; LOW ELECTRICAL FIELD; ON-CURRENTS; SOURCE/DRAIN STRUCTURES; STRESS-INDUCED; SUBTHRESHOLD SWING; THIN-FILM TRANSISTOR (TFTS); TRAP STATE;

EID: 84872935140     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.10.095     Document Type: Conference Paper
Times cited : (18)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.