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Volumn 13, Issue 6, 2010, Pages

Bipolar resistive switching characteristics of transparent indium gallium zinc oxide resistive random access memory

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTION MECHANISM; DC VOLTAGE; ENDURANCE TEST; HIGH-RESISTANCE STATE; INDIUM GALLIUM ZINC OXIDES; INDIUM TIN OXIDE; OHM'S LAW; RESISTANCE RATIO; RESISTANCE SWITCHING; RESISTIVE RANDOM ACCESS MEMORY; RESISTIVE SWITCHING; ROOM TEMPERATURE; SPACE-CHARGE-LIMITED CURRENT; VISIBLE REGION;

EID: 77951151750     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3360181     Document Type: Article
Times cited : (112)

References (20)
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    • DOI 10.1126/science.1153909
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    • (2008) Science , vol.319 , Issue.5870 , pp. 1625-1626
    • Meijer, G.I.1
  • 9
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  • 17
    • 36048964246 scopus 로고    scopus 로고
    • Anode-interface localized filamentary mechanism in resistive switching of Ti O2 thin films
    • DOI 10.1063/1.2749846
    • K. M. Kim, B. J. Choi, Y. C. Shin, S. Choi, and C. S. Hwang, Appl. Phys. Lett. APPLAB 0003-6951, 91, 012907 (2007) (ISI). 10.1063/1.2749846 (Pubitemid 350092117)
    • (2007) Applied Physics Letters , vol.91 , Issue.1 , pp. 012907
    • Kim, K.M.1    Choi, B.J.2    Shin, Y.C.3    Choi, S.4    Hwang, C.S.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.