-
1
-
-
0028409580
-
"On the super lateral growth phenomenon observed in excimer laser-induecd crystallization of thin Si film"
-
J. S. Im and H. J. Kim, "On the super lateral growth phenomenon observed in excimer laser-induecd crystallization of thin Si film," Appl. Phys. Lett., vol. 64, no. 17, pp. 2303-2305, 1994.
-
(1994)
Appl. Phys. Lett.
, vol.64
, Issue.17
, pp. 2303-2305
-
-
Im, J.S.1
Kim, H.J.2
-
2
-
-
0034819161
-
"Device degradation of n-channel poly-Si TFTs due to high field, hot carrier, and radiation stressing"
-
Singapore
-
A. Khamesra et al., "Device degradation of n-channel poly-Si TFTs due to high field, hot carrier, and radiation stressing," in Proc. IPFA2001, Singapore, 2001, pp. 258-262.
-
(2001)
Proc. IPFA2001
, pp. 258-262
-
-
Khamesra, A.1
-
3
-
-
85053286037
-
"Hot carrier effect in n-channel polycrystalline silicon thin film transistors: A correlation between off-current and transconductance variation"
-
Mar
-
G. Fortunato, A. Pecora, G. Tallarida, L. Maducci, C. Reita, and P. Migliorato, "Hot carrier effect in n-channel polycrystalline silicon thin film transistors: A correlation between off-current and transconductance variation," IEEE Trans. Electron Devices, vol. 41, no. 3, pp. 340-346, Mar. 1994.
-
(1994)
IEEE Trans. Electron. Devices
, vol.41
, Issue.3
, pp. 340-346
-
-
Fortunato, G.1
Pecora, A.2
Tallarida, G.3
Maducci, L.4
Reita, C.5
Migliorato, P.6
-
4
-
-
0032050442
-
"Analysis of drain field and hot carrier stability of poly-Si thin film transistors"
-
Apr
-
J. R. Ayres, S. D. Brotherton, D. J. Mcculloch, and M. J. Trainor, "Analysis of drain field and hot carrier stability of poly-Si thin film transistors," Jpn J. Appl. Phys., vol. 37, no. 4A, pp. 1801-1808, Apr. 1998.
-
(1998)
Jpn. J. Appl. Phys.
, vol.37
, Issue.4 A
, pp. 1801-1808
-
-
Ayres, J.R.1
Brotherton, S.D.2
McCulloch, D.J.3
Trainor, M.J.4
-
5
-
-
0002916260
-
"Degradation of polysilicon TFTs during dynamic stress"
-
A. G. Lewis, I. Wu, M. Hack, A. Chaing, and R. H. Bruce, "Degradation of polysilicon TFTs during dynamic stress," in IEDM Tech. Dig., 1991, pp, 575-578.
-
(1991)
IEDM Tech. Dig.
, pp. 575-578
-
-
Lewis, A.G.1
Wu, I.2
Hack, M.3
Chaing, A.4
Bruce, R.H.5
-
6
-
-
0027591006
-
"Physical models for degradation effects in polysilicon thin-film transistors"
-
May
-
M. Hack, A. G. Lewis, and I. Wu, "Physical models for degradation effects in polysilicon thin-film transistors," IEEE Trans. Electron Devices, vol. 40, no. 5, pp. 890-897, May 1993.
-
(1993)
IEEE Trans. Electron. Devices
, vol.40
, Issue.5
, pp. 890-897
-
-
Hack, M.1
Lewis, A.G.2
Wu, I.3
-
7
-
-
0030241288
-
"Threshold voltage, field effective mobility, and gate-to-channel capacitance in polysilicon TFrs"
-
Sep
-
M. D. Jacunski, M. Shur, and M. Hack, "Threshold voltage, field effective mobility, and gate-to-channel capacitance in polysilicon TFrs," IEEE Trans. Electron Devices, vol. 43, no. 9, pp. 1433-1440, Sep. 1996.
-
(1996)
IEEE Trans. Electron. Devices
, vol.43
, Issue.9
, pp. 1433-1440
-
-
Jacunski, M.D.1
Shur, M.2
Hack, M.3
-
8
-
-
0026953354
-
"Frequency-dependent capacitance-voltage characteristics for amorphous silicon-based metal-insulator-semiconductor structures"
-
Nov
-
J. S. Choi and G. W. Neudeck, "Frequency-dependent capacitance-voltage characteristics for amorphous silicon-based metal-insulator-semiconductor structures," IEEE Trans. Electron Devices, vol. 39, no. 11, pp. 2515-2522, Nov. 1992.
-
(1992)
IEEE Trans. Electron. Devices
, vol.39
, Issue.11
, pp. 2515-2522
-
-
Choi, J.S.1
Neudeck, G.W.2
-
9
-
-
0023564219
-
"The relation between oxide charge and device degradation: A comparative study of n- and p-channel MOSFETs"
-
Dec
-
A. Schwerin, W. Hansch, and W. Weber, "The relation between oxide charge and device degradation: A comparative study of n- and p-channel MOSFETs," IEEE Trans. Electron Devices, vol. 34, no. 12, pp. 2493-2500, Dec. 1987.
-
(1987)
IEEE Trans. Electron. Devices
, vol.34
, Issue.12
, pp. 2493-2500
-
-
Schwerin, A.1
Hansch, W.2
Weber, W.3
-
10
-
-
0036638433
-
"Improvement of polycrystalline silicon thin film transistor using oxygen plasma pretreatment before laser crystallization"
-
Jul
-
K. C. Moon, J. H. Lee, and M. K. Han, "Improvement of polycrystalline silicon thin film transistor using oxygen plasma pretreatment before laser crystallization," IEEE Trans. Electron Devices, vol. 49, no. 7, pp. 1319-1322, Jul. 2002.
-
(2002)
IEEE Trans. Electron. Devices
, vol.49
, Issue.7
, pp. 1319-1322
-
-
Moon, K.C.1
Lee, J.H.2
Han, M.K.3
-
12
-
-
0022009168
-
"Hot-electron-induced MOSFET degradation - Model, monitor and improvement"
-
Feb
-
C. Hu, S. C. Tam, F. C. K. Hsu, P. K. Ko, T. Y. Chan, and K. W. Terrill, "Hot-electron-induced MOSFET degradation - Model, monitor and improvement," IEEE J. Solid-State Circuits, vol. sc-20, no. 1, pp. 295-305, Feb. 1985.
-
(1985)
IEEE J. Solid-State Circuits
, vol.sc-20
, Issue.1
, pp. 295-305
-
-
Hu, C.1
Tam, S.C.2
Hsu, F.C.K.3
Ko, P.K.4
Chan, T.Y.5
Terrill, K.W.6
-
13
-
-
0024627772
-
"Effects of trap-stae density reduction by plasma hydrogenation in low temperature polysilicon TFT"
-
Mar
-
I. W. Wu, A. G. Lewis, T. Y. Huang, and A. Chiang, "Effects of trap-stae density reduction by plasma hydrogenation in low temperature polysilicon TFT," IEEE Trans. Electron Devices, vol. 10, no. 3, pp. 123-125, Mar. 1989.
-
(1989)
IEEE Trans. Electron. Devices
, vol.10
, Issue.3
, pp. 123-125
-
-
Wu, I.W.1
Lewis, A.G.2
Huang, T.Y.3
Chiang, A.4
-
14
-
-
0031176928
-
"Bias temperature instability in hydrogenated thin film transistors"
-
Jul
-
N. Bhat, M. Cao, and K. C. Saraswat, "Bias temperature instability in hydrogenated thin film transistors," IEEE Trans. Electron Devices vol. 44, no. 7, pp. 1102-1108, Jul. 1997.
-
(1997)
IEEE Trans. Electron. Devices
, vol.44
, Issue.7
, pp. 1102-1108
-
-
Bhat, N.1
Cao, M.2
Saraswat, K.C.3
-
15
-
-
0032121870
-
"Positive oxide charge from hot hole injection during channel hot electron stress"
-
Jul
-
K. M. Han and C. T. Sah, "Positive oxide charge from hot hole injection during channel hot electron stress," IEEE Trans. Electron Devices vol. 45, no. 7, pp. 1624-1627, Jul. 1998.
-
(1998)
IEEE Trans. Electron. Devices
, vol.45
, Issue.7
, pp. 1624-1627
-
-
Han, K.M.1
Sah, C.T.2
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