메뉴 건너뛰기




Volumn 52, Issue 4, 2005, Pages 512-517

The study of hot-carrier stress on poly-Si TFT employing C-V measurement

Author keywords

Capacitance voltage (C V); Hot carrier; Poly Si; Reliability; Thin film transistor (TFTs)

Indexed keywords

CAPACITANCE MEASUREMENT; ELECTRON TRAPS; GRAIN BOUNDARIES; HOT CARRIERS; POLYSILICON; VOLTAGE MEASUREMENT;

EID: 17444363758     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2005.844740     Document Type: Article
Times cited : (65)

References (15)
  • 1
    • 0028409580 scopus 로고
    • "On the super lateral growth phenomenon observed in excimer laser-induecd crystallization of thin Si film"
    • J. S. Im and H. J. Kim, "On the super lateral growth phenomenon observed in excimer laser-induecd crystallization of thin Si film," Appl. Phys. Lett., vol. 64, no. 17, pp. 2303-2305, 1994.
    • (1994) Appl. Phys. Lett. , vol.64 , Issue.17 , pp. 2303-2305
    • Im, J.S.1    Kim, H.J.2
  • 2
    • 0034819161 scopus 로고    scopus 로고
    • "Device degradation of n-channel poly-Si TFTs due to high field, hot carrier, and radiation stressing"
    • Singapore
    • A. Khamesra et al., "Device degradation of n-channel poly-Si TFTs due to high field, hot carrier, and radiation stressing," in Proc. IPFA2001, Singapore, 2001, pp. 258-262.
    • (2001) Proc. IPFA2001 , pp. 258-262
    • Khamesra, A.1
  • 3
    • 85053286037 scopus 로고
    • "Hot carrier effect in n-channel polycrystalline silicon thin film transistors: A correlation between off-current and transconductance variation"
    • Mar
    • G. Fortunato, A. Pecora, G. Tallarida, L. Maducci, C. Reita, and P. Migliorato, "Hot carrier effect in n-channel polycrystalline silicon thin film transistors: A correlation between off-current and transconductance variation," IEEE Trans. Electron Devices, vol. 41, no. 3, pp. 340-346, Mar. 1994.
    • (1994) IEEE Trans. Electron. Devices , vol.41 , Issue.3 , pp. 340-346
    • Fortunato, G.1    Pecora, A.2    Tallarida, G.3    Maducci, L.4    Reita, C.5    Migliorato, P.6
  • 4
    • 0032050442 scopus 로고    scopus 로고
    • "Analysis of drain field and hot carrier stability of poly-Si thin film transistors"
    • Apr
    • J. R. Ayres, S. D. Brotherton, D. J. Mcculloch, and M. J. Trainor, "Analysis of drain field and hot carrier stability of poly-Si thin film transistors," Jpn J. Appl. Phys., vol. 37, no. 4A, pp. 1801-1808, Apr. 1998.
    • (1998) Jpn. J. Appl. Phys. , vol.37 , Issue.4 A , pp. 1801-1808
    • Ayres, J.R.1    Brotherton, S.D.2    McCulloch, D.J.3    Trainor, M.J.4
  • 5
  • 6
    • 0027591006 scopus 로고
    • "Physical models for degradation effects in polysilicon thin-film transistors"
    • May
    • M. Hack, A. G. Lewis, and I. Wu, "Physical models for degradation effects in polysilicon thin-film transistors," IEEE Trans. Electron Devices, vol. 40, no. 5, pp. 890-897, May 1993.
    • (1993) IEEE Trans. Electron. Devices , vol.40 , Issue.5 , pp. 890-897
    • Hack, M.1    Lewis, A.G.2    Wu, I.3
  • 7
    • 0030241288 scopus 로고    scopus 로고
    • "Threshold voltage, field effective mobility, and gate-to-channel capacitance in polysilicon TFrs"
    • Sep
    • M. D. Jacunski, M. Shur, and M. Hack, "Threshold voltage, field effective mobility, and gate-to-channel capacitance in polysilicon TFrs," IEEE Trans. Electron Devices, vol. 43, no. 9, pp. 1433-1440, Sep. 1996.
    • (1996) IEEE Trans. Electron. Devices , vol.43 , Issue.9 , pp. 1433-1440
    • Jacunski, M.D.1    Shur, M.2    Hack, M.3
  • 8
    • 0026953354 scopus 로고
    • "Frequency-dependent capacitance-voltage characteristics for amorphous silicon-based metal-insulator-semiconductor structures"
    • Nov
    • J. S. Choi and G. W. Neudeck, "Frequency-dependent capacitance-voltage characteristics for amorphous silicon-based metal-insulator-semiconductor structures," IEEE Trans. Electron Devices, vol. 39, no. 11, pp. 2515-2522, Nov. 1992.
    • (1992) IEEE Trans. Electron. Devices , vol.39 , Issue.11 , pp. 2515-2522
    • Choi, J.S.1    Neudeck, G.W.2
  • 9
    • 0023564219 scopus 로고
    • "The relation between oxide charge and device degradation: A comparative study of n- and p-channel MOSFETs"
    • Dec
    • A. Schwerin, W. Hansch, and W. Weber, "The relation between oxide charge and device degradation: A comparative study of n- and p-channel MOSFETs," IEEE Trans. Electron Devices, vol. 34, no. 12, pp. 2493-2500, Dec. 1987.
    • (1987) IEEE Trans. Electron. Devices , vol.34 , Issue.12 , pp. 2493-2500
    • Schwerin, A.1    Hansch, W.2    Weber, W.3
  • 10
    • 0036638433 scopus 로고    scopus 로고
    • "Improvement of polycrystalline silicon thin film transistor using oxygen plasma pretreatment before laser crystallization"
    • Jul
    • K. C. Moon, J. H. Lee, and M. K. Han, "Improvement of polycrystalline silicon thin film transistor using oxygen plasma pretreatment before laser crystallization," IEEE Trans. Electron Devices, vol. 49, no. 7, pp. 1319-1322, Jul. 2002.
    • (2002) IEEE Trans. Electron. Devices , vol.49 , Issue.7 , pp. 1319-1322
    • Moon, K.C.1    Lee, J.H.2    Han, M.K.3
  • 12
    • 0022009168 scopus 로고
    • "Hot-electron-induced MOSFET degradation - Model, monitor and improvement"
    • Feb
    • C. Hu, S. C. Tam, F. C. K. Hsu, P. K. Ko, T. Y. Chan, and K. W. Terrill, "Hot-electron-induced MOSFET degradation - Model, monitor and improvement," IEEE J. Solid-State Circuits, vol. sc-20, no. 1, pp. 295-305, Feb. 1985.
    • (1985) IEEE J. Solid-State Circuits , vol.sc-20 , Issue.1 , pp. 295-305
    • Hu, C.1    Tam, S.C.2    Hsu, F.C.K.3    Ko, P.K.4    Chan, T.Y.5    Terrill, K.W.6
  • 13
    • 0024627772 scopus 로고
    • "Effects of trap-stae density reduction by plasma hydrogenation in low temperature polysilicon TFT"
    • Mar
    • I. W. Wu, A. G. Lewis, T. Y. Huang, and A. Chiang, "Effects of trap-stae density reduction by plasma hydrogenation in low temperature polysilicon TFT," IEEE Trans. Electron Devices, vol. 10, no. 3, pp. 123-125, Mar. 1989.
    • (1989) IEEE Trans. Electron. Devices , vol.10 , Issue.3 , pp. 123-125
    • Wu, I.W.1    Lewis, A.G.2    Huang, T.Y.3    Chiang, A.4
  • 14
    • 0031176928 scopus 로고    scopus 로고
    • "Bias temperature instability in hydrogenated thin film transistors"
    • Jul
    • N. Bhat, M. Cao, and K. C. Saraswat, "Bias temperature instability in hydrogenated thin film transistors," IEEE Trans. Electron Devices vol. 44, no. 7, pp. 1102-1108, Jul. 1997.
    • (1997) IEEE Trans. Electron. Devices , vol.44 , Issue.7 , pp. 1102-1108
    • Bhat, N.1    Cao, M.2    Saraswat, K.C.3
  • 15
    • 0032121870 scopus 로고    scopus 로고
    • "Positive oxide charge from hot hole injection during channel hot electron stress"
    • Jul
    • K. M. Han and C. T. Sah, "Positive oxide charge from hot hole injection during channel hot electron stress," IEEE Trans. Electron Devices vol. 45, no. 7, pp. 1624-1627, Jul. 1998.
    • (1998) IEEE Trans. Electron. Devices , vol.45 , Issue.7 , pp. 1624-1627
    • Han, K.M.1    Sah, C.T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.