An information-theory and Virtual Metrology-based approach to Run-to-Run semiconductor manufacturing control

IEEE International Conference on Automation Science and Engineering

Volumn , Issue , 2012, Pages 358-363

  Susto, Gian Antonio ^a   Schirru, Andrea ^b   Pampuri, Simone ^b   De Nicolao, Giuseppe ^b   Beghi, Alessandro ^a  

^a UNIVERSITY OF PADOVA   (Italy)

^b UNIVERSITY OF PAVIA   (Italy)

Author keywords

Entropy; Industry Automation; Semiconductor Manufacturing; Virtual Metrology

Indexed keywords

CONTROL APPROACH; CONTROL METHODS; INDUSTRY AUTOMATION; NOVEL STRATEGIES; PROCESS ITERATION; REAL METROLOGY; RUN-TO-RUN; SEMICONDUCTOR MANUFACTURING; SEMICONDUCTOR PLANTS; SIMULATION STUDIES; SOFT-SENSING; VIRTUAL LOOPS; VIRTUAL METROLOGY;

ENTROPY; INFORMATION THEORY; SEMICONDUCTOR DEVICE MANUFACTURE; SUSTAINABLE DEVELOPMENT;

UNITS OF MEASUREMENT;

EID: 84872531658     PISSN: 21618070     EISSN: 21618089     Source Type: Conference Proceeding    
DOI: 10.1109/CoASE.2012.6386416     Document Type: Conference Paper

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