Preliminary study of run-to-run control utilizing virtual metrology with reliance index

IEEE International Conference on Automation Science and Engineering

Volumn , Issue , 2011, Pages 256-261

  Kao, Chi An ^a   Cheng, Fan Tien ^a   Wu, Wei Ming ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

reliance index (RI); Run to run (R2R) control; virtual metrology (VM)

Indexed keywords

ADVANCED PROCESS CONTROL; FEED-BACK LOOP; INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS; R2R CONTROL; RELIANCE INDEX (RI); RUN-TO-RUN CONTROL; VIRTUAL METROLOGY;

INTELLIGENT CONTROL; UNITS OF MEASUREMENT;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 82455219045     PISSN: 21618070     EISSN: 21618089     Source Type: Conference Proceeding    
DOI: 10.1109/CASE.2011.6042446     Document Type: Conference Paper

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