Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition

Superconductor Science and Technology

Volumn 26, Issue 2, 2013, Pages

  Ziegler, Mario ^a   Fritzsch, Ludwig ^a   Day, Julia ^a   Linzen, Sven ^a   Anders, Solveig ^a   Toussaint, Julia ^a   Meyer, Hans Georg ^a  

^a LEIBNIZ INSTITUTE OF PHOTONIC TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMALITY; DEPOSITION PROCESS; FOUR-POINT PROBE MEASUREMENTS; HYDROGEN PLASMAS; LOW RESISTIVITY; METAL ORGANIC; METAL ORGANIC PRECURSORS; NBN THIN FILM; NIOBIUM NITRIDE; OXYGEN CONCENTRATIONS; PLASMA PARAMETER; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; SENSING DEVICES; SUPERCONDUCTOR ELECTRONICS;

ATOMIC LAYER DEPOSITION; DEPOSITS; NIOBIUM; NITRIDES; ORGANOMETALLICS; SENSORS; SUPERCONDUCTIVITY; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION;

SUPERCONDUCTING TRANSITION TEMPERATURE;

EID: 84872363622     PISSN: 09532048     EISSN: 13616668     Source Type: Journal    
DOI: 10.1088/0953-2048/26/2/025008     Document Type: Article

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