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Physica C: Superconductivity and its Applications

Volumn 468, Issue 7-10, 2008, Pages 793-796

Fabrication of metallic structures with lateral dimensions less than 15 nm and jc (T)-measurements in NbN micro- and nanobridges

(5) Bartolf, H a Engel, A a Schilling, A a Il'in, K b Siegel, M b

a PHYSIK INSTITUT DER UNIVERSITÄT ZÜRICH (Switzerland)

b UNIVERSITY OF KARLSRUHE (Germany)

Author keywords

Critical current; Electron beam lithography; Etching; Lift off; Superconductivity; Thin films; Vortex barrier

Indexed keywords

CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); DEPOSITION; ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTRIC CURRENT MEASUREMENT; ELECTRIC CURRENTS; ELECTRON BEAM LITHOGRAPHY; GEOMETRY; SUPERCONDUCTIVITY; THIN FILMS;

NANOBRIDGES; VORTEX BARRIERS; VORTEX ENTRY;

NANOSTRUCTURES;

EID: 44449162442 PISSN: 09214534 EISSN: None Source Type: Journal
DOI: 10.1016/j.physc.2007.11.049 Document Type: Article

Times cited : (8)

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