Effects of annealing and deposition temperature on the structural and optical properties of AZO thin films

Journal of Materials Science: Materials in Electronics

Volumn 24, Issue 1, 2013, Pages 142-147

  Kars Durukan, I ^a   Ozen Y ^a   Kizilkaya, K ^a   Ozturk M K ^a   Memmedli, T ^a   Ozcelik S ^a  

^a GAZI UNIVERSITY   (Turkey)

Author keywords

[No Author keywords available]

Indexed keywords

AIR ATMOSPHERE; AL-DOPED ZNO; ANNEALING TEMPERATURES; ATOMIC FORCE MICROSCOPE (AFM); AZO FILMS; AZO THIN FILMS; CRYSTALLINITIES; DEEP LEVEL EMISSION; DEPOSITED FILMS; DEPOSITION TEMPERATURES; DIFFRACTION PEAKS; FULL WIDTH HALF MAXIMUM; HEXAGONAL STRUCTURES; PL EMISSION; POST DEPOSITION ANNEALING; POSTGROWTH ANNEALING; SI (100) SUBSTRATE; STRUCTURAL AND OPTICAL PROPERTIES; SUBSTRATE TEMPERATURE;

ANNEALING; ATOMIC FORCE MICROSCOPY; DEPOSITS; OPTICAL PROPERTIES; POINT DEFECTS; SURFACE ROUGHNESS; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; ZINC OXIDE;

ATMOSPHERIC TEMPERATURE;

EID: 84871964358     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-012-0957-5     Document Type: Article

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