Structure, morphology and properties of Fe-doped ZnO films prepared by facing-target magnetron sputtering system

Applied Surface Science

Volumn 255, Issue 15, 2009, Pages 6881-6887

  Wang, Changzheng ^a   Chen, Zhong ^b   He, Ying ^a   Li, Lanying ^a   Zhang, Dong ^a  

^a LIAOCHENG UNIVERSITY   (China)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Facing target magnetron sputtering system; Fe doped ZnO films; Morphology; Properties; Structure

Indexed keywords

DOPING (ADDITIVES); ENERGY GAP; FACINGS; FILM PREPARATION; II-VI SEMICONDUCTORS; IRON; MAGNETRON SPUTTERING; METALLIC FILMS; MORPHOLOGY; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SPECTROMETERS; STRUCTURE (COMPOSITION); X RAY DIFFRACTION; ZINC OXIDE;

CONCENTRATION OF FE; FE-DOPED; FERROMAGNETIC PROPERTIES; PARAMAGNETIC PROPERTIES; PROPERTIES; RAMAN SPECTROMETERS; TARGET MAGNETRON; UV-VIS SPECTROPHOTOMETERS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 67349253833     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.03.008     Document Type: Article

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