SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 1, 2013, Pages

Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition

(6) Jung, Tae Hoon a Park, Jin Seong a Kim, Dong Ho b Jeong, Yongsoo b Park, Sung Gyu b Kwon, Jung Dae b

a Dankook University (South Korea)

b Korea Institute of Material Science (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINITIES; DIETHYL ZINC; EFFECT OF IN; EXPOSURE-TIME; GRAIN BOUNDARY SCATTERING; HYDROGEN PLASMA TREATMENTS; HYDROGEN PLASMAS; LOW TEMPERATURES; OXYGEN DEFICIENCY; OXYGEN SOURCES; POLYCRYSTAL GROWTH; POLYCRYSTALLIZATION; ZINC OXIDE (ZNO); ZNO; ZNO FILMS;

CARRIER CONCENTRATION; DEIONIZED WATER; GRAIN BOUNDARIES; METALLIC FILMS; OXYGEN; PHOTOELECTRONS; PLASMA APPLICATIONS; TEMPERATURE; VOLTAGE DIVIDERS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC; ZINC OXIDE;

ATOMIC LAYER DEPOSITION;

EID: 84871912710 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.4767813 Document Type: Article

Times cited : (17)

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