Nondestructive characterization of a TiN metal gate: Chemical and structural properties by means of standing-wave hard x-ray photoemission spectroscopy

Journal of Applied Physics

Volumn 112, Issue 11, 2012, Pages

  Papp, C ^a,d,f   Conti, G ^a,f   Balke, B ^a,e,f   Ueda, S ^b   Yamashita, Y ^b   Yoshikawa, H ^b   Uritsky, Y S ^c   Kobayashi, K ^b   Fadley, C S ^a,f  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c APPLIED MATERIALS INC   (United States)

^d UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^e JOHANNES GUTENBERG UNIVERSITY   (Germany)

^f UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BRAGG CONDITIONS; BURIED INTERFACE; CHEMICAL STATE; DEPTH PROFILE; HARD X-RAY PHOTOEMISSION; HARD X-RAY PHOTOEMISSION SPECTROSCOPY; INCIDENCE ANGLES; METAL GATE; MULTI-LAYER MIRRORS; NANOSCALE MULTILAYERS; NATIVE OXIDES; NONDESTRUCTIVE CHARACTERIZATION; OXIDIZED SURFACES; QUANTITATIVE RESULT; ROCKING CURVES; SEMICONDUCTOR SYSTEMS; STANDING WAVE; TIN METAL GATE;

INTERFACE STATES; MIRRORS; MULTILAYERS; NONDESTRUCTIVE EXAMINATION; PHOTOELECTRON SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

TITANIUM NITRIDE;

EID: 84871181340     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4765720     Document Type: Article

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