Titanium nitride thin films deposited by reactive pulsed-laser ablation in RF plasma

Surface and Coatings Technology

Volumn 151-152, Issue , 2002, Pages 316-319

  Giardini, A ^a   Marotta, V ^a   Orlando, S ^a   Parisi, G P ^a  

^a CNR   (Italy)

Author keywords

Radio frequency (RF) plasma; Reactive pulsed laser deposition; Titanium nitride

Indexed keywords

NEODYMIUM LASERS; OPTICAL MICROSCOPY; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

RADIO FREQUENCY (RF) PLASMA;

THIN FILMS;

DEPOSITION; FILM; SILICON; TITANIUM NITRIDE;

EID: 17444450043     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01563-8     Document Type: Article

References (10)