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Volumn 729, Issue , 2013, Pages 210-215

On the fabrication parameters of buried microchannels integrated in in-plane silicon microprobes

Author keywords

Buried microchannel; Deep reactive ion etching; Hollow microprobes; Microfluidics

Indexed keywords

DRY ETCHING; MICROCHANNELS; REACTIVE ION ETCHING; SILICON;

EID: 84870746502     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.729.210     Document Type: Conference Paper
Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.