Trimethyl-aluminum and ozone interactions with graphite in atomic layer deposition of Al2O3

Journal of Applied Physics

Volumn 112, Issue 10, 2012, Pages

  McDonnell, Stephen ^a   Pirkle, Adam ^a   Kim, Jiyoung ^a   Colombo, Luigi ^b   Wallace, Robert M ^a  

^a The University of Texas at Dallas   (United States)

^b TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORBED SPECIES; AFM; CARBON SURFACE; CARBON-CONTAINING SPECIES; CHEMICAL INTERACTIONS; CONFORMAL GROWTH; DEPOSITED FILMS; EX-SITU ATOMIC FORCE MICROSCOPY; FUNCTIONALIZATIONS; GRAPHITE SURFACES; LOW TEMPERATURES; OZONE REACTIONS; PROCESS CONDITION; PULSE SEQUENCE; PURGE TIME; ROOM TEMPERATURE; SEED LAYER;

ALUMINUM; ATOMIC FORCE MICROSCOPY; CARBON FILMS; GRAPHITE; OZONE; OZONE LAYER; PHOTOELECTRONS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION;

EID: 84870700195     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4766408     Document Type: Article

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