Annealing effect on the near-band edge emission of ZnO

Journal of Physics and Chemistry of Solids

Volumn 74, Issue 2, 2013, Pages 291-297

  Khomyak, V V ^a   Slyotov, M M ^a   Shtepliuk, I I ^b   Lashkarev, G V ^b   Slyotov, O M ^a   Marianchuk, P D ^a   Kosolovskiy, V V ^a  

^a CHERNIVTSI NATIONAL UNIVERSITY   (Ukraine)

^b FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

Author keywords

A. Thin films; C. X ray diffraction; D. Crystal structure; D. Defects; D. Luminescence

Indexed keywords

ANNEALING EFFECTS; AS-GROWN; DEPOSITED FILMS; DIRECT CURRENT MAGNETRON SPUTTERING; LUMINESCENCE SPECTRUM; MODULATION METHODS; NEAR BAND EDGE EMISSIONS; RADIATIVE TRANSITIONS; ULTRA-VIOLET; ZNO; ZNO FILMS; ZNO THIN FILM;

ATOMIC FORCE MICROSCOPY; BAND STRUCTURE; LUMINESCENCE; METALLIC FILMS; SAPPHIRE; X RAY DIFFRACTION; ZINC OXIDE;

ANNEALING;

EID: 84870415249     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2012.10.001     Document Type: Article

References (56)

1. U. Ozgur, Ja.I. Alilov, C. Lin, A. Teke, M.A. Reshchikov, S. Dogan, V. Avrutin, S.-J. Cho, and H. Morkoe J. Appl. Phys. 98 2005 041301-1 041301-103
2. V.A. Karpina, V.I. Lazorenko, G.V. Lashkarev, V.D. Dobrowolski, L.I. Kopylova, V.A. Baturin, S.A. Pustovoytov, A. Ju, S.A. Karpenko, P.M. Eremin, V.P. Lytvyn, E.A. Ovsyannikov, and Mazurenko Cryst. Res. Technol. 39 2004 980 992
3. T. Atsushi, O. Akira, O. Takeyoshi, O. Makoto, M. Takayuki, M. Sumiha, K. Chtani, S.F. Chichibu, S. Fuke, Y. Segawa, H. Ohno, H. Kainuma, and M. Kawasaki Nature Mater. 4 2005 42 46
4. Y.R. Ryu, J.A. Lubguban, T.S. Lee, H.W. White, T.S. Jeong, C.J. Youn, and B. Kim J. Appl. Phys. Lett. 90 2007 131115 131117
5. Y.W. Zhang, X.M. Li, W.D. Yu, X.D. GaO, Y.F. Gu, C. Yang, J.L. Zhao, X.W. Sun, S.T. Tan, J.F. Kong, and W.Z. Shen J. Phys. D Appl. Phys. 41 2008 205105 205111
6. Y. Kashiwaba, K. Sugawara, and K. Haga Thin Solid Films 441 2002 87 90
7. H.J. Ko, Y.E. Chen, and Z. Zhu Appl. Phys. Lett. 76 2000 1905 1907
8. Y. Natsume, and H. Sakata Thin Solid Films 372 2000 30 36
9. K.K. Kim, J.H. Song, H.J. Jung, and W.K. Choi J. Appl. Phys. 87 2000 3573 3575
10. G.B. Zhang, C.S. Shi, and Z.F. Han Chin. Phys. Lett. 18 2001 441 442
11. J. Aramovich, A. Oritiz., and R.H. Bube J. Vac. Sci. Technol. 16 1979 994 1003
12. B.J. Jin, S. Im, and S.Y. Lee Thin Solid Films 366 2000 107 110
13. T. Matsumoto, H. Kato, K. Miyamoto, M. Sano, and T. Yao Appl. Phys. Lett. 81 2002 1231 1233
14. M. Zerdali, S. Hamzaoui, F.H. Teherani, and D. Rogers Mater. Lett. 60 2006 504 508
15. T.W. Kim, K.D. Kwack, H.K. Kim, Y.S. Yoon, J.H. Bahang, and H.L. Park Solid State Commun. 127 2003 635 638
16. L.S. Kim, S.H. Jeong, S.S. Kim, and B.T. Lee Semicond. Sci. Technol. 19 2004 L29 L31
17. K. Keem, H. Kim, G.T. Kim, J.S. Lee, B. Min, K. Cho, M.Y. Sung, and S. Kim Appl. Phys. Lett. 84 2004 4376 4738
18. K. Vanhensden, W.L. Warren, C.H. Seager, D.R. Tallant, J.A. Voigt, and B.E. Gnade J. Appl. Phys. 79 1996 7911-7915
19. W.S. Shi, O. Agyeman, and C.N. Xu J. Appl. Phys. 91 2002 5640 5645
20. J. Cho, J. Nah, M.S. Ch, J.H. Song, K.H. Yoon, H.J. Jung, and W. Choi Japan. J. Appl. Phys. 40 2001 L1040 L1043
21. K. Ogata, K. Sakurai, S. Fujita, and S. Fjita J. Cryst. Growth 214/215 2000 312 315
22. K. Ozaki, and M. Gomi Japan. J. Appl. Phys. 41 2002 5614 5617
23. N. Ohashi, T. Ishigaki, N. Okada, T. Sekiguchi, I. Sakaguchi, and H. Haneda Appl. Phys. Lett. 80 2002 2869 2871
24. K. Vanheusden, C.H. Seager, W.L. Warren, D.R. Tallant, and J.A. Voigt Appl. Phys. Lett. 68 1996 403 407
25. X. Xu, C. Xu, J. Dai, J. Pan, and J. Hu J. Phys. Chem. Solids 73 2012 858 862
26. H. Zeng, G. Duan, Y. Li, S. Yang, X. Xu, and W. Cai Adv. Funct. Mater. 20 2010 561 572
27. H. Zeng, S. Yang, X. Xu, and W. Cai Appl. Phys. Lett. 95 2009 191904-1 191904-3
28. V.P. Makhniy, M.M. Slyotov, E.V. Stets, I.V. Tkachenko, V.V. Gorley, and P.P. Horley Thin Solid Films 450 2004 222 225
29. G.-X. Liang, P. Fan, X.-M. Cai, D.-P. Zhang, and Z.-H. Zheng J. Electron. Mater. 40 2011 267 273
30. C. Suryanarayana, and M.G. Norton X-Ray diffraction: A Practical Approach, Plenum Press, New York, 1998
31. H. Karzel, V. Potzel, V. Köferlein, W. Schiessl, V. Steiner, U. Hiller, and G.M. Kalvius Phys. Rev. B 53 1996 11425 11438
32. J.W. Shin, and J.Y. Lee Appl. Phys. Lett. 88 2006 091911 091913
33. N. Shimomura, D. Kim, and M. Nakayama J. Lumin. 112 2005 191 195
34. K.K. Kim, S. Niki, J.Y. Oh, J.O. Song, T.Y. Seong, S.J. Park, S. Fujita, and S.W. Kim J. Appl. Phys. 97 2005 066103 066105
35. S. Tusemen, and K.B. Vcer Appl. Phys. Lett. 80 2002 1195 1197
36. J.N. Zeng, J.K. Low, Z.M. Ren, T. Liew, and Y.F. Lu Appl. Surf. Sci. 197 2002 362 367
37. X.C. Chen, J.P. Zhou, H.Y. Wang, P.S. Xu, and G.Q. Pan Chin. Phys. B 20 2011 096102-1 096102-3
38. J. Albertsson, C. Abrahamss, and A. Kvick Acta Crystallogr. B 45 1989 34 40
39. S.H. Park, T. Hanada, D.C. Oh, T. Minegishi, H. Goto, G. Fujimoto, J.S. Park, I.H. Im, J.H. Chang, M.W. Cho, T. Yao, and K. Inaba Appl. Phys. Lett. 91 2007 231904-1 231904-3
40. G.K. Williamson, and R.E. Smallman Philos. Mag. 1 1956 34
41. N. Fujimura, T. Nishihara, S. Goto, J. Xu, and T. Ito J. Cryst. Growth 130 1993 269 279
42. C. Jagadish, and S.J. Pearton Zinc Oxide Bulk, Thin Films and Nanostructures: Processing, Properties and Applications 2006 Elsevier Amsterdam
43. A. Janotti, and C.G. Van de Walle J. Cryst. Growth 287 2006 58 65
44. A.N. Georgobiani, A.N. Gruzintsev, E.E. Yakimov, C. Barthou, and P. Benallol Semiconductor 39 2005 661 665
45. F.N. Leiter, H.R. Alves, and F. Hofstaetter Phys. Status Solidi B 226 2001 R4 R5
46. X.H. Li, A.P. Huand, M.K. Zhu, H. Wang, B. Hang, and H. Yan Mater. Lett. 57 2003 4655 4659
47. J.S. Kang, H.S. Kang, S.S. Pang, E.S. Shim, and S.Y. Lee Thin Solid Films 443 2003 5 8
48. Z.F. Liu, F.K. Shan, Y.X. Li, B.S. Shin, and Y.S. Yu J. Cryst. Growth 259 2003 130 136
49. J. Liu, S. Lee, Y.H. Ahn, J.-Y. Park, and K.H. Koh J. Phys. D Appl. Phys. 42 2009 095401 095407
50. J.-P. Xu, S.B. Shi, L. Li, X.-S. Zhang, Y.-X. Wang, and X.-M. Chen Chin. Phys. Lett. 27 2010 047803-1 047803-4
51. S.-Y. Chu, W. Water, and J.-T. Liaw J. Eur. Ceram. Soc. 23 2003 1593 1598
52. F. Oba, S.R. Nishitani, S. Isotani, H. Adachi, and I. Tanaka J. Appl. Phys. 90/2 2001 824 828
53. J.I. Pankove Optical Processes In Semiconductors 1971 Prentice-Hall, New Jersey, Inc Englewood Cliffs
54. A.A. Berg, and P.J. Dean Light-Emitting Diodes 1976 Clarendon Oxford
55. M. Aven, and J.S. Prener Physics and Chemistry of II-VI Compounds Amsterdam 1967 North-Holland Publishing Company
56. V.P. Gribkovskii The Theory of Light Absorption and Emission in Semiconductors 1975 Naukai Teknika Minsk