Chemical fabrication of p-type Cu 2O transparent thin film using molecular precursor method

Materials Chemistry and Physics

Volumn 137, Issue 1, 2012, Pages 252-257

  Nagai, Hiroki ^a   Suzuki, Tatsuya ^a   Hara, Hiroki ^a   Mochizuki, Chihiro ^a   Takano, Ichiro ^a   Honda, Tohru ^a   Sato, Mitsunobu ^a  

^a KOGAKUIN UNIVERSITY   (Japan)

Author keywords

Chemical synthesis; Electrical characterization; Heat treatment; Semiconductors; Thin films

Indexed keywords

ACCEPTOR LEVELS; AVERAGE GRAIN SIZE; CHEMICAL FABRICATION; CHEMICAL SYNTHESIS; CRITICAL LOAD; CUBIC LATTICE; ELECTRICAL CHARACTERIZATION; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; GLASS SUBSTRATES; HALL EFFECT MEASUREMENT; MOLECULAR PRECURSOR; MOLECULAR PRECURSOR METHOD; OPTICAL BANDS; P TYPE SEMICONDUCTOR; P-TYPE; PRECURSOR FILMS; PRECURSOR SOLUTIONS; SCRATCH TEST; TETRAACETIC ACID; THERMAL REACTIONS; TRANSPARENT THIN FILM; WET PROCESS;

ABSORPTION SPECTROSCOPY; ACTIVATION ENERGY; ARRHENIUS PLOTS; ETHANOL; FABRICATION; FILM THICKNESS; HEAT TREATMENT; PHOTOELECTRONS; SEMICONDUCTOR MATERIALS; SODIUM; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER;

EID: 84868213406     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2012.09.016     Document Type: Article

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