Nitrogen doping into Cu2O thin films deposited by reactive radio-frequency magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 4 B, 2001, Pages 2765-2768

  Ishizuka, Shogo ^a   Kato, Shinya ^a   Maruyama, Takahiro ^b   Akimoto, Katsuhiro ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

Cuprous oxide; Nitrogen doping; P type semiconductor; Reactive sputtering; Solar cell

Indexed keywords

CARRIER CONCENTRATION; COPPER OXIDES; HALL EFFECT; HOLE TRAPS; MAGNETRON SPUTTERING; NITROGEN; SEMICONDUCTOR DOPING; SPUTTER DEPOSITION;

DOPANTS; MASS THEORY;

THIN FILMS;

EID: 0035300783     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.2765     Document Type: Article

References (7)