-
1
-
-
38349148649
-
-
10.1039/b712874f
-
X. S. Fang, Y. Bando, U. Gautam, C. H. Ye, and D. Golberg, J. Mater. Chem. 18, 509 (2008). 10.1039/b712874f
-
(2008)
J. Mater. Chem.
, vol.18
, pp. 509
-
-
Fang, X.S.1
Bando, Y.2
Gautam, U.3
Ye, C.H.4
Golberg, D.5
-
2
-
-
0035827304
-
-
10.1126/science.1060367
-
M. H. Huang, S. Mao, H. Feick, H. Yan, Y. Wu, H. Kind, E. Weber, R. Russo, and P. Yang, Science 292, 1897 (2001). 10.1126/science.1060367
-
(2001)
Science
, vol.292
, pp. 1897
-
-
Huang, M.H.1
Mao, S.2
Feick, H.3
Yan, H.4
Wu, Y.5
Kind, H.6
Weber, E.7
Russo, R.8
Yang, P.9
-
4
-
-
1042289088
-
-
10.1002/adma.200305729
-
W. I. Park and G.-C. Yi, Adv. Mater. 16, 87 (2004). 10.1002/adma. 200305729
-
(2004)
Adv. Mater.
, vol.16
, pp. 87
-
-
Park, W.I.1
Yi, G.-C.2
-
5
-
-
0035831290
-
-
10.1126/science.1058120
-
Z. W. Pan, Z. R. Dai, and Z. L. Wang, Science 291, 1947 (2001). 10.1126/science.1058120
-
(2001)
Science
, vol.291
, pp. 1947
-
-
Pan, Z.W.1
Dai, Z.R.2
Wang, Z.L.3
-
6
-
-
77957103941
-
-
10.1016/j.physb.2010.07.013
-
H. I. Abdulgafour, Z. Hassan, N. H. Al-Hardan, and F. K. Yam, Physica B 405, 4216 (2010). 10.1016/j.physb.2010.07.013
-
(2010)
Physica B
, vol.405
, pp. 4216
-
-
Abdulgafour, H.I.1
Hassan, Z.2
Al-Hardan, N.H.3
Yam, F.K.4
-
7
-
-
0033568039
-
-
10.1021/ja991085a
-
F. Krumeich, H. J. Muhr, M. Niederberger, F. Bieri, B. Schnyder, and R. Nesper, J. Am. Chem. Soc. 121, 8324 (1999). 10.1021/ja991085a
-
(1999)
J. Am. Chem. Soc.
, vol.121
, pp. 8324
-
-
Krumeich, F.1
Muhr, H.J.2
Niederberger, M.3
Bieri, F.4
Schnyder, B.5
Nesper, R.6
-
9
-
-
37849019011
-
-
10.1016/j.jcrysgro.2007.11.026
-
T. Sahoo, E.-S. Kang, M. Kim, V. Kannan, Y.-T. Yu, D.-C. Shin, T.-G. Kim, and I.-H. Lee, J. Cryst. Growth 310, 570 (2008). 10.1016/j.jcrysgro.2007.11.026
-
(2008)
J. Cryst. Growth
, vol.310
, pp. 570
-
-
Sahoo, T.1
Kang, E.-S.2
Kim, M.3
Kannan, V.4
Yu, Y.-T.5
Shin, D.-C.6
Kim, T.-G.7
Lee, I.-H.8
-
10
-
-
11244291383
-
-
10.1166/jnn.2004.135
-
S. Y. Li, P. Lin, C. Y. Lee, M. S. Ho, and T. Y. Tseng, J. Nanosci. Nanotechnol. 4, 968 (2004). 10.1166/jnn.2004.135
-
(2004)
J. Nanosci. Nanotechnol.
, vol.4
, pp. 968
-
-
Li, S.Y.1
Lin, P.2
Lee, C.Y.3
Ho, M.S.4
Tseng, T.Y.5
-
11
-
-
4143108889
-
-
10.1021/nl049461z
-
H. T. Ng, J. Han, T. Yamada, P. Nguyen, Y. P. Chen, and M. Meyyappan, Nano Lett. 4, 1247 (2004). 10.1021/nl049461z
-
(2004)
Nano Lett.
, vol.4
, pp. 1247
-
-
Ng, H.T.1
Han, J.2
Yamada, T.3
Nguyen, P.4
Chen, Y.P.5
Meyyappan, M.6
-
12
-
-
0348107238
-
-
10.1063/1.1630849
-
Y. Zhang, H. Jia, R. Wang, C. Chen, X. Luo, D. Yu, and C. Lee, Appl. Phys. Lett. 83, 4631 (2003). 10.1063/1.1630849
-
(2003)
Appl. Phys. Lett.
, vol.83
, pp. 4631
-
-
Zhang, Y.1
Jia, H.2
Wang, R.3
Chen, C.4
Luo, X.5
Yu, D.6
Lee, C.7
-
13
-
-
9244226547
-
-
10.1021/cm049182c
-
P. Chang, Z. Fan, W. Tseng, D. Wang, W. Chiou, J. Hong, and J. G. Lu, Chem. Mater. 16, 5133 (2004). 10.1021/cm049182c
-
(2004)
Chem. Mater.
, vol.16
, pp. 5133
-
-
Chang, P.1
Fan, Z.2
Tseng, W.3
Wang, D.4
Chiou, W.5
Hong, J.6
Lu, J.G.7
-
15
-
-
79956010166
-
-
10.1063/1.1518810
-
C. J. Lee, T. J. Lee, S. C. Lyu, Y. Zhang, H. Ruh, and H. J. Lee, Appl. Phys. Lett. 81, 3648 (2002). 10.1063/1.1518810
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 3648
-
-
Lee, C.J.1
Lee, T.J.2
Lyu, S.C.3
Zhang, Y.4
Ruh, H.5
Lee, H.J.6
-
17
-
-
0346101516
-
-
10.1021/nl034463p
-
X. Y. Kong and Z. L. Wang, Nano Lett. 3, 1625 (2003). 10.1021/nl034463p
-
(2003)
Nano Lett.
, vol.3
, pp. 1625
-
-
Kong, X.Y.1
Wang, Z.L.2
-
18
-
-
56849132315
-
-
10.1021/nn800631r
-
Z. L. Wang, ACS Nano 2, 1987 (2008). 10.1021/nn800631r
-
(2008)
ACS Nano
, vol.2
, pp. 1987
-
-
Wang, Z.L.1
-
19
-
-
3342937662
-
-
10.1146/annurev.physchem.55.091602.094416
-
Z. L. Wang, Annu. Rev. Phys. Chem. 55, 159 (2004). 10.1146/annurev. physchem.55.091602.094416
-
(2004)
Annu. Rev. Phys. Chem.
, vol.55
, pp. 159
-
-
Wang, Z.L.1
-
20
-
-
0037116538
-
-
10.1002/1521-4095(20020116)14:2<158::AID-ADMA158>3.0.CO;2-W
-
H. Kind, H. Q. Yan, B. Messer, M. Law, and P. D. Yang, Adv. Mater. 14, 158 (2002). 10.1002/1521-4095(20020116)14:2<158::AID-ADMA158>3.0.CO;2-W
-
(2002)
Adv. Mater.
, vol.14
, pp. 158
-
-
Kind, H.1
Yan, H.Q.2
Messer, B.3
Law, M.4
Yang, P.D.5
-
21
-
-
79953269369
-
-
10.1016/j.jallcom.2011.02.100
-
H. I. Abdulgafour, F. K. Yam, Z. Hassan, K. Al-Heuseen, and M. J. Jawad, J. Alloys Compd. 509, 5627 (2011). 10.1016/j.jallcom.2011.02.100
-
(2011)
J. Alloys Compd.
, vol.509
, pp. 5627
-
-
Abdulgafour, H.I.1
Yam, F.K.2
Hassan, Z.3
Al-Heuseen, K.4
Jawad, M.J.5
-
22
-
-
27744461790
-
-
10.1021/jp0509358
-
C. Ye, X. Fang, Y. Hao, X. Teng, and L. Zhang, J. Phys. Chem. B 109, 19758 (2005). 10.1021/jp0509358
-
(2005)
J. Phys. Chem. B
, vol.109
, pp. 19758
-
-
Ye, C.1
Fang, X.2
Hao, Y.3
Teng, X.4
Zhang, L.5
-
23
-
-
61549116853
-
-
10.1021/cg7012599
-
X. D. Yan, Z. W. Li, R. Q. Chen, and W. Gao, Cryst. Growth Des. 8 (7), 2406 (2008). 10.1021/cg7012599
-
(2008)
Cryst. Growth Des.
, vol.8
, Issue.7
, pp. 2406
-
-
Yan, X.D.1
Li, Z.W.2
Chen, R.Q.3
Gao, W.4
-
24
-
-
53549128113
-
-
10.1021/jp8019107
-
Y. Sun, N. A. Fox, D. J. Riley, and M. N. R. Ashfold, J. Phys. Chem. C 112 (25), 9234 (2008). 10.1021/jp8019107
-
(2008)
J. Phys. Chem. C
, vol.112
, Issue.25
, pp. 9234
-
-
Sun, Y.1
Fox, N.A.2
Riley, D.J.3
Ashfold, M.N.R.4
-
25
-
-
50449110579
-
-
10.1557/JMR.2008.0274
-
S. Xu, C. S. Lao, B. Weintraub, and Z. L. Wang, J. Mater. Res. 23 (8), 2072 (2008). 10.1557/JMR.2008.0274
-
(2008)
J. Mater. Res.
, vol.23
, Issue.8
, pp. 2072
-
-
Xu, S.1
Lao, C.S.2
Weintraub, B.3
Wang, Z.L.4
-
26
-
-
0037418370
-
-
10.1002/adma.200390108
-
L. Vayssieres, Adv. Mater. 15 (5), 464 (2003). 10.1002/adma.200390108
-
(2003)
Adv. Mater.
, vol.15
, Issue.5
, pp. 464
-
-
Vayssieres, L.1
-
27
-
-
0041511976
-
-
10.1063/1.1592306
-
D. G. Zhao, S. J. Xu, M. H. Xie, S. Y. Tong, and H. Yang, Appl. Phys. Lett. 83 (4), 677 (2003). 10.1063/1.1592306
-
(2003)
Appl. Phys. Lett.
, vol.83
, Issue.4
, pp. 677
-
-
Zhao, D.G.1
Xu, S.J.2
Xie, M.H.3
Tong, S.Y.4
Yang, H.5
-
28
-
-
0029774658
-
-
10.1063/1.116699
-
K. Vanheusden, C. H. Seager, W. L. Warren, D. R. Tallant, and J. A. Voigt, Appl. Phys. Lett. 68 (3), 403 (1996). 10.1063/1.116699
-
(1996)
Appl. Phys. Lett.
, vol.68
, Issue.3
, pp. 403
-
-
Vanheusden, K.1
Seager, C.H.2
Warren, W.L.3
Tallant, D.R.4
Voigt, J.A.5
-
30
-
-
81355163360
-
-
10.1063/1.3660284
-
U. Ilyas, R. S. Rawat, T. L. Tan, P. Lee, R. Chen, H. D. Sun, L. Fengji, and S. Zhang, J. Appl. Phys. 110, 093522 (2011). 10.1063/1.3660284
-
(2011)
J. Appl. Phys.
, vol.110
, pp. 093522
-
-
Ilyas, U.1
Rawat, R.S.2
Tan, T.L.3
Lee, P.4
Chen, R.5
Sun, H.D.6
Fengji, L.7
Zhang, S.8
-
31
-
-
0002081496
-
-
10.1063/1.362349
-
K. Vanheusden, W. L. Warren, C. H. Seager, D. R. Tallant, J. A. Voigt, and B. E. Gnade, J. Appl. Phys. 79, 7983 (1996). 10.1063/1.362349
-
(1996)
J. Appl. Phys.
, vol.79
, pp. 7983
-
-
Vanheusden, K.1
Warren, W.L.2
Seager, C.H.3
Tallant, D.R.4
Voigt, J.A.5
Gnade, B.E.6
-
32
-
-
80054750318
-
-
10.1016/j.apsusc.2011.08.093
-
H. I. Abdulgafour, Z. Hassan, F. K. Yam, K. AL-Heuseen, and Y. Yusof, Appl. Surf. Sci. 258, 461 (2011). 10.1016/j.apsusc.2011.08.093
-
(2011)
Appl. Surf. Sci.
, vol.258
, pp. 461
-
-
Abdulgafour, H.I.1
Hassan, Z.2
Yam, F.K.3
Al-Heuseen, K.4
Yusof, Y.5
-
35
-
-
0031123017
-
-
10.1063/1.118777
-
J. C. Carrano, P. A. Grudowski, C. J. Eiting, R. D. Dupuis, and J. C. Campbell, Appl. Phys. Lett. 70, 1992 (1997). 10.1063/1.118777
-
(1997)
Appl. Phys. Lett.
, vol.70
, pp. 1992
-
-
Carrano, J.C.1
Grudowski, P.A.2
Eiting, C.J.3
Dupuis, R.D.4
Campbell, J.C.5
-
36
-
-
36349032764
-
-
10.1088/0957-4484/18/49/495701
-
S. Y. Lee and S. K. Lee, Nanotechnology 18, 495701 (2007). 10.1088/0957-4484/18/49/495701
-
(2007)
Nanotechnology
, vol.18
, pp. 495701
-
-
Lee, S.Y.1
Lee, S.K.2
-
37
-
-
84862816772
-
-
10.1016/j.snb.2011.08.049
-
L. Guo, H. Zhang, D. Zhao, B. Li, Z. Zhang, M. Jiang, and D. Shen, Sens. Actuators B 166-167, 12 (2012). 10.1016/j.snb.2011.08.049
-
(2012)
Sens. Actuators B
, vol.166-167
, pp. 12
-
-
Guo, L.1
Zhang, H.2
Zhao, D.3
Li, B.4
Zhang, Z.5
Jiang, M.6
Shen, D.7
-
38
-
-
73849123782
-
-
10.1149/1.3264650
-
W. Y. Weng, S. J. Chang, C. L. Hsu, T. J. Hsueh, and S. P. Changa, J. Electrochem. Soc. 157, K30-K33 (2010). 10.1149/1.3264650
-
(2010)
J. Electrochem. Soc.
, vol.157
-
-
Weng, W.Y.1
Chang, S.J.2
Hsu, C.L.3
Hsueh, T.J.4
Changa, S.P.5
-
39
-
-
34248140089
-
-
10.1021/nl070111x
-
C. Soci, A. Zhang, B. Xiang, S. A. Dayeh, D. P. R. Aplin, J. Park, X. Y. Bao, Y. H. Lo, and D. Wang, Nano Lett. 7, 1003 (2007). 10.1021/nl070111x
-
(2007)
Nano Lett.
, vol.7
, pp. 1003
-
-
Soci, C.1
Zhang, A.2
Xiang, B.3
Dayeh, S.A.4
Aplin, D.P.R.5
Park, J.6
Bao, X.Y.7
Lo, Y.H.8
Wang, D.9
-
40
-
-
33747342699
-
-
L. J. Mandalapu, F. Xiu, Z. Yang, and J. Liu, Mater. Res. Soc. Symp. Proc. 891, 1-6 (2006).
-
(2006)
Mater. Res. Soc. Symp. Proc.
, vol.891
, pp. 1-6
-
-
Mandalapu, L.J.1
Xiu, F.2
Yang, Z.3
Liu, J.4
-
42
-
-
11044236143
-
-
available online
-
Y. W. HeO, D. P. Norton, L. C. Tien, Y. Kwon, B. S. Kang, F. Ren, and S. J. Pearton, Mater. Sci. Eng. R47, 1-47 (2004); available online http://dx.doi.org/10.1016/j.mser.2004.09.001.
-
(2004)
Mater. Sci. Eng.
, vol.47
, pp. 1-47
-
-
Heo, Y.W.1
Norton, D.P.2
Tien, L.C.3
Kwon, Y.4
Kang, B.S.5
Ren, F.6
Pearton, S.J.7
-
43
-
-
3042772787
-
-
10.1063/1.1763633
-
S. E. Ahn, J. S. Lee, H. Kim, S. Kim, B. H. Kang, K. H. Kim, and G. T. Kim, Appl. Phys. Lett. 84 (24), 5022 (2004). 10.1063/1.1763633
-
(2004)
Appl. Phys. Lett.
, vol.84
, Issue.24
, pp. 5022
-
-
Ahn, S.E.1
Lee, J.S.2
Kim, H.3
Kim, S.4
Kang, B.H.5
Kim, K.H.6
Kim, G.T.7
-
44
-
-
13444266169
-
-
10.1063/1.1840116
-
Q. H. Li, Y. X. Liang, Q. Wan, and T. H. Wang, Appl. Phys. Lett. 85 (26), 6389 (2004). 10.1063/1.1840116
-
(2004)
Appl. Phys. Lett.
, vol.85
, Issue.26
, pp. 6389
-
-
Li, Q.H.1
Liang, Y.X.2
Wan, Q.3
Wang, T.H.4
-
45
-
-
18744364874
-
-
10.1063/1.1841453
-
Z. Fan, P. C. Chang, J. G. Lu, E. C. Walter, R. M. Penner, C. H. Lin, and H. P. Lee, Appl. Phys. Lett. 85 (25), 6128 (2004). 10.1063/1.1841453
-
(2004)
Appl. Phys. Lett.
, vol.85
, Issue.25
, pp. 6128
-
-
Fan, Z.1
Chang, P.C.2
Lu, J.G.3
Walter, E.C.4
Penner, R.M.5
Lin, C.H.6
Lee, H.P.7
|