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Volumn 4, Issue 8, 2004, Pages 968-971
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Fabrication of vertical ZnO nanowires on silicon (100) with epitaxial ZnO buffer layer
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Author keywords
Nanowires; Photoluminescence; Transmission Electron Microscopy; Vapor Liquid Solid Growth; X ray Diffraction; ZnO
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Indexed keywords
NANO-ELECTRONIC DEVICES;
NANOWIRES;
RADIO-FREQUENCY (RF) SPUTTERING;
VAPOR-LIQUID-SOLID GROWTH;
AUGER ELECTRON SPECTROSCOPY;
BINDING ENERGY;
EPITAXIAL GROWTH;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
PHOTOLUMINESCENCE;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTOR MATERIALS;
SILICON;
TRANSMISSION ELECTRON MICROSCOPY;
ULTRAVIOLET RADIATION;
X RAY DIFFRACTION;
ZINC OXIDE;
NANOSTRUCTURED MATERIALS;
NANOTUBE;
SILICON;
ZINC OXIDE;
ADSORPTION;
ARTICLE;
CHEMISTRY;
CONFORMATION;
CRYSTALLIZATION;
ELECTRICITY;
EVALUATION;
MATERIALS TESTING;
METHODOLOGY;
NANOTECHNOLOGY;
SEMICONDUCTOR;
SURFACE PROPERTY;
ULTRASTRUCTURE;
ADSORPTION;
CRYSTALLIZATION;
ELECTRIC WIRING;
MATERIALS TESTING;
MOLECULAR CONFORMATION;
NANOTECHNOLOGY;
NANOTUBES;
SEMICONDUCTORS;
SILICON;
SURFACE PROPERTIES;
ZINC OXIDE;
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EID: 11244291383
PISSN: 15334880
EISSN: None
Source Type: Journal
DOI: 10.1166/jnn.2004.135 Document Type: Article |
Times cited : (27)
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References (20)
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