Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor

Micro and Nanosystems

Volumn 4, Issue 3, 2012, Pages 199-207

  Arockiasamya, S ^a   Maiyalagan, T ^b   Kuppusami, P ^c   Mallika, C ^c   Nagaraja, K S ^d  

^a VIT UNIVERSITY   (India)

^b Nanyang Technological University   (Singapore)

^c INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

^d LOYOLA COLLEGE   (India)

Author keywords

Chemical vapour deposition; Metallic Ti; Nano composite; Nickel; Thin films; Titanium nitride; Vapour pressure

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; CYCLOPENTADIENYLS; DEPOSITION OF FILMS; DEPOSITION PRESSURES; ENERGY DISPERSIVE ANALYSIS; FACE CENTERED CUBIC STRUCTURE; GLANCING INCIDENCE X-RAY DIFFRACTIONS; METAL-ORGANIC; METAL-ORGANIC COMPLEXES; NANO-COMPOSITE COATING; ORGANOMETALLIC PRECURSORS; PHASE IDENTIFICATION; PLASMA ENVIRONMENTS; STANDARD ENTHALPY; SUBSTRATE TEMPERATURE; TI PRECURSOR; VAPOUR PRESSURES;

COMPOSITE COATINGS; COMPOSITE FILMS; ETHYLENE; NANOCOMPOSITES; NICKEL COMPOUNDS; NITROGEN PLASMA; ORGANIC CHEMICALS; ORGANOMETALLICS; PLASMA DEPOSITION; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); THIN FILMS; TITANIUM; TITANIUM NITRIDE; VAPORS; X RAY DIFFRACTION;

NICKEL;

EID: 84867017634     PISSN: 18764029     EISSN: 18764037     Source Type: Journal    
DOI: 10.2174/1876402911204030199     Document Type: Article

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