Deposition of conductive films onto silicon, germanium, and SiO 2/Si structures via pyrolysis of titanocene and zirconocene dichlorides in the presence of organosilicon compounds

Inorganic Materials

Volumn 38, Issue 1, 2002, Pages 34-38

  Mittov, O N ^a   Ponomareva, N I ^a   Mittova, I Ya ^a   Bezryadin, M N ^a  

^a VORONEZH STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

GERMANIUM; ORGANOSILICON DERIVATIVE; SILICON; TITANOCENE; ZIRCONOCENE;

ANALYTIC METHOD; ARTICLE; AUGER ELECTRON SPECTROSCOPY; CHEMICAL COMPOSITION; CHEMICAL PROCEDURES; CHEMICAL REACTION; FILM; PHYSICAL CHEMISTRY; PYROLYSIS; REGIONAL ANESTHESIA; VAPOR; X RAY DIFFRACTION;

EID: 9344227900     PISSN: 00201685     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1013647310115     Document Type: Article

References (13)

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