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Materials Science and Engineering: B

Volumn 176, Issue 6, 2011, Pages 473-476

Nanostructural characterization of TiN-Ni films: A XAFS study

(5) Pinakidou, F a Katsikini, M a Paloura, E C a Akbari, A b Riviere, J P b

a ARISTOTLE UNIVERSITY OF THESSALONIKI (Greece)

b UNIVERSITÉ DE POITIERS (France)

Author keywords

EXAFS; Ion Beam Assisted Deposition; NEXAFS; TiN coatings; TiN Ni nanocomposite films

Indexed keywords

AMORPHOUS FILMS; BINARY ALLOYS; CHEMICAL BONDS; EXTENDED X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY; ION BEAM ASSISTED DEPOSITION; ION BEAMS; NANOCOMPOSITE FILMS; NANOCOMPOSITES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TITANIUM; TITANIUM NITRIDE; X RAY ABSORPTION;

EXAFS; ION BEAM-ASSISTED DEPOSITION; NANOSTRUCTURAL; NEXAFS; NI CONTENT; NI FILMS; TIN COATING; TIN-NI NANOCOMPOSITE FILM; X-RAY ABSORPTION FINE-STRUCTURE SPECTROSCOPIES; XAFS;

TIN;

EID: 79953189713 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/j.mseb.2010.02.032 Document Type: Article

Times cited : (9)

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