Vapor pressures of precursors for the CVD of titanium nitride and tin oxide

Chemical Vapor Deposition

Volumn 7, Issue 3, 2001, Pages 101-104

  Van Mol, A M B ^a   Driessen, J P A M ^a   Linden, J L ^a   De Croon, M H J M ^b   Spee, C I M A ^a   Schouten, J C ^b  

^a TNO   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001253911     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(200105)7:3<101::AID-CVDE101>3.0.CO;2-Z     Document Type: Article

References (17)

1. C. I. M. A. Spee, F. Verbeek, J. G. Kraaijkamp, J. L. Linden, T. Rutten, H. Delhaye, E. A. Van der Zouwen, H. A. Meinema, Mater. Sci. Eng. 1993, B17, 108.
2. C. I. M. A. Spee, J. L. Linden, A. Mackor, K. Timmer, H. A. Meinema, Mater. Res. Soc. Symp. Proc. 1996, 425, 93.
3. E. Waffenschmidt, J. Musolf, M. Heuken, K. Heime, J. Supercond. 1992, 5, 119.
4. U. König, R. Taberski, H. van den Berg, Surf. Coat. Technol. 1991, 50, 57.
5. L. H. Dubois, B. R. Zigarski, G. S. Girolami, J. Electrochem. Soc. 1992, 139, 3603.
6. P. F. Gerhardinger, R. J. McCurdy, Mater. Res. Soc. Symp. Proc. 1996, 426, 399.
7. K. Singh, R. Y. Tamakloe, Sol. Energy, 1996, 56, 343.
8. S. Young, Sci. Proc. Roy. Dublin Soc. 1909, 12, 374.
9. W. Hieber, E. Reindl, Z. Elektrochem. 1940, 46, 559.
10. A. Kabesh, R. S. Nyholm, J. Chem. Soc., 1951, 3245.
11. M. Usanovich, A. Dembitskii, J. Gen. Chem. USSR (Engl. Transl.) 1959, 29, 1744.
12. D. R. Stull, Ind. Eng. Chem., 1947, 39, 517.
13. H. Korsching, Z. Naturforsch. 1946, 1, 219.
14. W. J. Moore, Physical Chemistry, Longman, London, 1972.
15. G. A. Nash, H. A. Skinner, W. F. Stack, Trans. Faraday Soc. 1965, 61, 640.
16. J. L. Buchanan, C. McKown, J. Non-Cryst. Solids 1997, 218, 179.
17. Material Safety Data Sheet, Schumacher Air Products and Chemicals Inc., Carlsbad, CA 92009, USA, 1994.