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Volumn 14, Issue 38, 2012, Pages 13429-13436

Nanoscale engineering of radiation tolerant silicon carbide

(9) Zhang, Yanwen a,b Ishimaru, Manabu c Varga, Tamas d Oda, Takuji b Hardiman, Chris e Xue, Haizhou b Katoh, Yutai a Shannon, Steven e Weber, William J a,b

a OAK RIDGE NATIONAL LABORATORY (United States)

b University of Tennessee (United States)

c OSAKA UNIVERSITY (Japan)

d PACIFIC NORTHWEST NATIONAL LABORATORY (United States)

e North Carolina State University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84866378557 PISSN: 14639076 EISSN: None Source Type: Journal
DOI: 10.1039/c2cp42342a Document Type: Article

Times cited : (114)

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