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Volumn 82, Issue 6, 2003, Pages 913-915

Atomic-level study of ion-induced nanoscale disordered domains in silicon carbide

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; GOLD; ION BEAMS; IONS; OPTOELECTRONIC DEVICES;

EID: 0037428684     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1542686     Document Type: Article
Times cited : (20)

References (17)
  • 17
    • 0004329136 scopus 로고    scopus 로고
    • National Center for Electron Microscopy, Lawrence Berkeley Laboratory, Berkley, CA
    • R. Kilaas, NECM HRTEM Image Simulation Software, National Center for Electron Microscopy, Lawrence Berkeley Laboratory, Berkley, CA.
    • NECM HRTEM Image Simulation Software
    • Kilaas, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.