Nearly full-dense and fine-grained AZO:Y ceramics sintered from the corresponding nanoparticles

Nanoscale Research Letters

Volumn 7, Issue , 2012, Pages

  Yang, Ye ^a   Lan, Pinjun ^a   Wang, Muqin ^a   Wei, Tiefeng ^a   Tan, Ruiqin ^b   Song, Weijie ^a  

^a NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING   (China)

^b NINGBO UNIVERSITY   (China)

Author keywords

AZO:Y ceramic; Coprecipitation; Finer grain; Nanoparticles; Nearly full density; Sintering

Indexed keywords

ALUMINUM-DOPED ZINC OXIDE; AZO:Y CERAMIC; BULK RESISTIVITY; CO-PRECIPITATION PROCESS; FINER GRAINS; GRAIN SIZE; HIGH QUALITY; MEAN PARTICLE DIAMETER; OPTICAL AND ELECTRICAL PROPERTIES; PRESSURELESS SINTERING; PROPERTY MEASUREMENT; SINTERED CERAMICS; SPUTTERING TARGET; THEORETICAL DENSITY; TRANSPARENT CONDUCTIVE FILMS;

CERAMIC MATERIALS; COPRECIPITATION; ELECTRIC PROPERTIES; ENERGY DISPERSIVE SPECTROSCOPY; GRAIN SIZE AND SHAPE; NANOPARTICLES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SINTERING; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

YTTRIUM ALLOYS;

EID: 84866124854     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-7-481     Document Type: Article

References (23)

1. David SG, Hideo H, David CP: Handbook of Transparent Conductors. New York: Springer; 2010.
2. Elvira F, David G, Hideo H, David CP: Transparent conducting oxides for photovoltaics. MRS Bull 2007, 32:242-247.
3. Klaus E: Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties. J Phys D: Appl Phys 2000, 33:R17-R32.
4. Liu CP, Jeng GR: Properties of aluminum doped zinc oxide materials and sputtering thin films. J Alloys Compd 2009, 468:343-349.
5. Minami T, Oda J, Nomoto J, Muyata T: Effect of target properties on transparent conducting impurity-doped ZnO thin films deposited by DC magnetron sputtering. Thin Solid Films 2010, 519:385-390.
6. Tohsophon T, Hüpkes J, Siekmann, Rech B, Schultheis M, Sirikulrat N: High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells. Thin Solid Films 2008, 516:4628-4632.
7. Wu MW, Liu DS, Su YH: The densification, microstructure, and electrical properties of aluminum-doped zinc oxide sputtering target for transparent conductive oxide film. J Euro Ceram Soc,. in press.
8. Medvedovski E, Alvarez N, Yankov O, Olsson MK: Advanced indium-tin oxide ceramics for sputtering targets. Ceram Int 2008, 34:1173-1182.
9. Neves N, Barros R, Antunes E, Ferreira I, Calado J, Fortunato E, Martins R: Sintering behavior of nano-and micro-sized ZnO powder targets for rf magnetron sputtering applications. J Am Ceram Soc 2012, 95:204-210.
10. Wan D, Huang F, Wang Y, Mou X, Xu F: Highly surface-textured ZnO:Al films fabricated by controlling the nucleation and growth separately for solar cell applications. ACS Appl Mater Interfaces 2010, 2:2147-2152.
11. Huang HS, Tung HC, Chiu CH, Hong IT, Chen RZ, Chang JT, Lin HK: Highly conductive alumina-added ZnO ceramic target prepared by reduction sintering and its effects on the properties of deposited thin films by direct current magnetron sputtering. Thin Solid Films 2010, 518:6071-6075.
12. 3 target by slip casting. J Am Ceram Soc 2009, 92:2168-2171.
13. Hwang B, Paek YK, Yang SH, Lim S, Seo WS, Oh KS: Densification of Al-doped ZnO via preliminary heat treatment under external pressure. J Alloys Compd 2011, 509:7478-7483.
14. Zhang Y, Tan R, Yang Y, Zhang X, Wang W, Cui P, Song W: Two-step sintering of pristine and aluminum-doped zinc oxide ceramics. Int J Appl Ceram Technol,. in press.
15. Minami T, Yamamoto Y, Miyata Y: Highly transparent and conductive rare earthdoped ZnO thin films prepared by magnetron sputtering. Thin Sold Films 2000, 366:63-68.
16. Han X, Han K, Tao M: Low resistivity yttrium-doped zinc oxide by electrochemical deposition. J Electrochem Soc 2010, 157:H593-H597.
17. Ruske F, Sittinger TV, Werner W, Szyszka B, van Osten KU, Dietrich K, Rix R: Hydrogen doping of DC sputtered ZnO:Al films from novel target material. Surf CoatTechnol 2005, 200:236-240.
18. Rix R, Dietrich K, Schaff W, Van Osten KU: PVD coating material, International Application No.;. PCT/EP2004/00148.
19. Tsai YZ, Wang NF, Tseng MR, Hsu FH: Transparent conducting Al and Y codoped ZnO thin film deposited by DC sputtering. Mater Chem Phys 2010, 123:300-303.
20. α radiation, and neutron single crystal data from 1.01 Å neutrons. Acta Chem Scand 1991, 45:226-230.
21. Zhang Y, Wang W, Tan R, Yang Y, Zhang X, Cui P, Song W: The solubility and temperature dependence of resistivity for aluminum-doped zinc oxide ceramic. Int J Appl Ceram Technol,. in press.
22. Han J, Mantas PQ, Senos AMR: Densification and grain growth of Al-doped ZnO. J Mater Res 2001, 16:459-468.
23. Sato Y, Oba F, Yodogawa M, Yamamoto T, Ikuhara Y: Al-doped ZnO ceramics fabricated by mechanical alloying and high-pressure sintering technique. J Mater Sci Lett 2003, 22:1201-1204.