Highly surface-textured ZnO:Al films fabricated by controlling the nucleation and growth separately for solar cell applications

ACS Applied Materials and Interfaces

Volumn 2, Issue 7, 2010, Pages 2147-2152

  Wan, Dongyun ^a   Huang, Fuqiang ^a   Wang, Yaoming ^a   Mou, Xinliang ^a   Xu, Fangfang ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

surface textured; thin film solar cells; transparent conducting oxide; two step sputtering; ZnO:Al thin films

Indexed keywords

AS-DEPOSITED FILMS; AZO FILMS; DEPOSITION CONDITIONS; ELECTRICAL PROPERTY; GROWTH FRONT; HAZE FACTORS; MAGNETRON SPUTTERING PROCESS; NUCLEATION AND GROWTH; ROOM TEMPERATURE; ROOT MEAN SQUARE ROUGHNESS; SEED LAYER; SMALL GRAIN SIZE; SOLAR-CELL APPLICATIONS; SQUARE RESISTANCE; THIN-FILM SOLAR CELLS; TRANSPARENT CONDUCTING OXIDE; TRANSPARENT CONDUCTING OXIDE FILMS; TRANSPARENT ELECTRODE; TWO-STEP MECHANISMS; ZNO; ZNO:AL FILMS; ZNO:AL THIN FILMS;

ALUMINUM; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; GRAIN GROWTH; GRAIN SIZE AND SHAPE; NUCLEATION; OPTICAL FILMS; OPTICAL PROPERTIES; OXYGEN; SOLAR CELLS; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

OXIDE FILMS;

EID: 79151478225     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am100416e     Document Type: Article

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