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Volumn 520, Issue 24, 2012, Pages 7147-7152
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Influence of Ag thickness of aluminum-doped ZnO/Ag/aluminum-doped ZnO thin films
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Author keywords
Aluminum doped zinc oxide; Electron beam evaporation; Multilayers; Radio frequency sputtering; Silver; Thin films; Transparent conductive oxides
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Indexed keywords
AG FILMS;
AG THICKNESS;
ALUMINUM-DOPED ZINC OXIDE;
ALUMINUM-DOPED ZNO;
BEST VALUE;
E BEAM EVAPORATION;
ELECTRON BEAM EVAPORATION;
FIGURE OF MERITS;
GLASS SUBSTRATES;
LAYER THICKNESS;
MULTI-LAYER THIN FILM;
RADIO FREQUENCY SPUTTERING;
RF-MAGNETRON SPUTTERING;
TRANSPARENT CONDUCTIVE OXIDES;
ZNO;
ZNO THIN FILM;
ALUMINUM;
ALUMINUM COATINGS;
EVAPORATION;
FILM PREPARATION;
MAGNETRON SPUTTERING;
METALLIC FILMS;
MULTILAYERS;
PHASE TRANSITIONS;
SUBSTRATES;
THIN FILMS;
ZINC OXIDE;
SILVER;
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EID: 84866041715
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2012.07.124 Document Type: Article |
Times cited : (59)
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References (22)
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