Characterization of ZnO:Al/Au/ZnO:Al trilayers for high performance transparent conducting electrodes

Thin Solid Films

Volumn 519, Issue 4, 2010, Pages 1470-1474

  Dimopoulos, T ^a   Radnoczi, G Z ^b   Pecz B ^b   Bruckl H ^a  

^a AIT AUSTRIAN INSTITUTE OF TECHNOLOGY   (Austria)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

Atomic force microscopy; Metal doped zinc oxide; Optical constant; Solar cells; Sputtering; Transmission electron microscopy; Transparent conducting oxides

Indexed keywords

FIGURE OF MERIT; LIGHT INCIDENCE; METAL-DOPED; OPTICAL TRANSMISSIONS; TRANSMISSION ELECTRON; TRANSPARENT CONDUCTING ELECTRODES; TRANSPARENT CONDUCTING OXIDE; TRILAYERS; WAVELENGTH RANGES; ZNO;

ALUMINUM; ATOMIC FORCE MICROSCOPY; ELECTRIC RESISTANCE; ELECTRODES; GOLD COATINGS; LIGHT REFLECTION; OPTICAL CONSTANTS; SOLAR CELLS; TRANSMISSION ELECTRON MICROSCOPY; ZINC; ZINC OXIDE;

LIGHT TRANSMISSION;

EID: 78349304574     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.09.049     Document Type: Article

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