Plasma-assisted atomic layer deposition of Al 2O 3 and parylene C bi-layer encapsulation for chronic implantable electronics

Applied Physics Letters

Volumn 101, Issue 9, 2012, Pages

  Xie, Xianzong ^a   Rieth, Loren ^a   Merugu, Srinivas ^a   Tathireddy, Prashant ^a   Solzbacher, Florian ^a  

^a University of Utah   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATED LIFETIME TESTING; BI-LAYER; BIOMEDICAL IMPLANTS; BODY TEMPERATURE; COATED SAMPLE; ELECTRONIC SYSTEMS; ELEVATED TEMPERATURE; IN-VITRO; INSULATION PERFORMANCE; INTER-DIGITATED ELECTRODES; PARYLENE C; PARYLENE COATINGS; PARYLENES; PHOSPHATE BUFFERED SALINE SOLUTIONS; SOAK TESTING; THREE DIMENSIONAL GEOMETRY;

ALUMINA; ALUMINUM; ATOMIC LAYER DEPOSITION; COATINGS; ELECTRIC CIRCUIT BREAKERS; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY;

PULSED LASER DEPOSITION;

EID: 84865850543     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4748322     Document Type: Article

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