Role of hydrogen in the surface passivation of crystalline silicon by sputtered aluminum oxide

Progress in Photovoltaics: Research and Applications

Volumn 19, Issue 3, 2011, Pages 320-325

  Li, Tsu Tsung Andrew ^a   Cuevas, Andres ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

aluminum oxide; sputtering; surface passivation

Indexed keywords

ALUMINUM OXIDE FILMS; ALUMINUM OXIDES; CRYSTALLINE SILICONS; DEPOSITION METHODS; HYDROGEN CONCENTRATION; NEGATIVE CHARGE; P-TYPE; RADIO FREQUENCY MAGNETRON SPUTTERING; SILICON OXIDE LAYERS; SURFACE PASSIVATION;

ALUMINUM; ATOMIC LAYER DEPOSITION; DESCALING; HYDROGEN; OXIDE FILMS; PASSIVATION; SEMICONDUCTING SILICON COMPOUNDS; SILICON OXIDES; SILICON WAFERS;

ALUMINUM COATINGS;

EID: 79953669857     PISSN: 10627995     EISSN: 1099159X     Source Type: Journal    
DOI: 10.1002/pip.1031     Document Type: Article

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