Development of a very large-area ultraviolet imprint lithography process

Microelectronic Engineering

Volumn 86, Issue 10, 2009, Pages 1983-1988

  Kim, Ki don ^a   Jeong, Jun ho ^a   Park, Sang hu ^b   Choi, Dae geun ^a   Choi, Jun hyuk ^a   Lee, Eung sug ^a  

^a Korea Institute of Machine and Materials   (South Korea)

^b Pusan National University   (South Korea)

Author keywords

Auto release; Hard stamp; Ultraviolet imprint process; Vacuum environment

Indexed keywords

AIR BUBBLES; AUTO RELEASE; DISPLAY PANELS; HARD STAMP; LOW VACUUM ENVIRONMENT; MICRO PATTERN; MICROSCALE PATTERNS; OPTICAL LITHOGRAPHY; OVERLAY ACCURACY; PHYSICAL PHENOMENA; PROCESS USE; RESIDUAL LAYER THICKNESS; SINGLE-STEP; ULTRAVIOLET IMPRINT PROCESS; ULTRAVIOLET-IMPRINT LITHOGRAPHY; UV IMPRINT; VACUUM ENVIRONMENT;

OXIDE MINERALS; PHOTOLITHOGRAPHY; QUARTZ; SUBSTRATES; VACUUM;

NANOIMPRINT LITHOGRAPHY;

EID: 67649921520     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.12.068     Document Type: Article

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