Ion-beam patterning of magnetic films using stencil masks

Applied Physics Letters

Volumn 75, Issue 3, 1999, Pages 403-405

  Terris, B D ^a   Folks, L ^a   Weller, D ^a   Baglin, J E E ^a   Kellock, A J ^a   Rothuizen, H ^b   Vettiger, P ^b  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000056779     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124389     Document Type: Article

References (13)

1. P. R. Krauss and S. Y. Chou, J. Vac. Sci. Technol. B 13, 2850 (1995); R. M. H. New, R. F. W. Pease, and R. L. White, ibid. 13, 1089 (1995); R. O'Barr, S. Y. Yamamoto, and S. Schultz, J. Appl. Phys. 81, 4730 (1997).
2. P. R. Krauss and S. Y. Chou, J. Vac. Sci. Technol. B 13, 2850 (1995); R. M. H. New, R. F. W. Pease, and R. L. White, ibid. 13, 1089 (1995); R. O'Barr, S. Y. Yamamoto, and S. Schultz, J. Appl. Phys. 81, 4730 (1997).
3. P. R. Krauss and S. Y. Chou, J. Vac. Sci. Technol. B 13, 2850 (1995); R. M. H. New, R. F. W. Pease, and R. L. White, ibid. 13, 1089 (1995); R. O'Barr, S. Y. Yamamoto, and S. Schultz, J. Appl. Phys. 81, 4730 (1997).
4. S. Y. Chou, Proc. IEEE 85, 652 (1997); L. Kong, L. Zhuang, and S. Y. Chou, IEEE Trans. Magn. 33, 3019 (1997).
5. S. Y. Chou, Proc. IEEE 85, 652 (1997); L. Kong, L. Zhuang, and S. Y. Chou, IEEE Trans. Magn. 33, 3019 (1997).
6. A. Fernandez, P. J. Bedrossian, S. L. Baker, S. P. Vernon, and D. R. Kania, IEEE Trans. Magn. 32, 4472 (1996); M. Farhoud, M. Hwang, H. I. Smith, M. L. Schattenburg, J. M. Bae, K. Youcef-Toumi, and C. A. Ross, ibid. 34, 1087 (1998).
7. A. Fernandez, P. J. Bedrossian, S. L. Baker, S. P. Vernon, and D. R. Kania, IEEE Trans. Magn. 32, 4472 (1996); M. Farhoud, M. Hwang, H. I. Smith, M. L. Schattenburg, J. M. Bae, K. Youcef-Toumi, and C. A. Ross, ibid. 34, 1087 (1998).
8. C. Chappert, H. Bernas, J. Ferre, V. Kottler, J.-P. Jamet, Y. Chen, E. Cambril, T. Devolder, F. Rousseaux, V. Mathet, and H. Launois, Science 280, 1919 (1998).
9. J. P. Jamet, T. Aign, P. Meyer, S. Lemerle, J. Ferre, J. Gierak, C. Vieu, H. Bernas, T. Devolder, V. Mathet, C. Chappert, E. Cambril, D. Decanini, and H. Launois, Proc. MORIS 99 (to be published).
10. J. K. Bhardwaj and H. Ashraf, Proc. SPIE 2639, 224 (1995).
11. Ion ranges were calculated using TRIM, J. P. Biersack and L. Haggmark, Nucl. Instrum. Methods 174, 257 (1980) (TRIM program for PCs available from J. F. Ziegler, jfz@us.ibm.com).
12. W. Primak and R. Kampwinh, J. Appl. Phys. 39, 5651 (1968); E. P. EerNisse, ibid. 45, 167 (1974).
13. W. Primak and R. Kampwinh, J. Appl. Phys. 39, 5651 (1968); E. P. EerNisse, ibid. 45, 167 (1974).