Facile fabrication of sub-20-nm nanochannels based on crystallinity- dependent anisotropic etching of silicon

Microelectronic Engineering

Volumn 98, Issue , 2012, Pages 309-312

  Song, Youngsup ^a   Kim, Min Ook ^a   Kwon, Dae Sung ^a   Kim, Yong Jun ^a   Kim, Jongbaeg ^a  

^a Yonsei University   (South Korea)

Author keywords

Anisotropic etching; Crystalline orientation; Etch selectivity; Nanochannels; Nanofluidics

Indexed keywords

ANISOTROPIC WET ETCHING; CRYSTALLINE ORIENTATIONS; CRYSTALLINITIES; ETCH SELECTIVITY; FACILE FABRICATION; MICRO-SCALES; NANO CHANNELS; SINGLE CRYSTALLINE SILICON; SINGLE-STEP; THIN-FILM DEPOSITIONS; WAFER SCALE;

ANISOTROPIC ETCHING; CRYSTALLINE MATERIALS; FABRICATION; NANOFLUIDICS; WET ETCHING;

SILICON WAFERS;

EID: 84865610061     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2012.07.100     Document Type: Conference Paper

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