SCOPUS 정보 검색 플랫폼

Volumn 26, Issue 1, 2008, Pages 67-71

Improvement of the wiggling profile of spin-on carbon hard mask by H 2 plasma treatment

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; ETCHING; PHOTORESISTS; PLASMA APPLICATIONS;

HYDROGEN IONS; OXIDE ETCHING; SPIN-ON CARBON (SOC); WIGGLING PROFILE;

PHOTOMASKS;

AMORPHOUS MATERIALS; CARBON;

EID: 38849190173 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.2819262 Document Type: Article

Times cited : (6)

References (7)

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