Etch durable spin-on hard mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7972, Issue , 2011, Pages

  Muramatsu, Makoto ^a   Iwashita, Mitsuaki ^a   Kondo, Takashi ^b   Hirose, Hisashi ^b   Fujimoto, Seiji ^b  

^a Tokyo Electron Kyusyu Ltd   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

Author keywords

Etching durability; High temperature cure; Spin on hard mask

Indexed keywords

COATING SYSTEM; CONVENTIONAL SYSTEMS; CRITICAL LAYER; ETCH RESISTANCE; FEATURE SIZES; HIGH TEMPERATURE CURE; MULTILAYER STACKS; PATTERN FORMATION; RESIST PROCESS; SPIN-ON HARD MASK; SPIN-ON HARD MASKS; STACK STRUCTURE; TOKYO ELECTRONS; UNDERLAYERS;

COATINGS;

EID: 79955903267     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.878863     Document Type: Conference Paper

References (0)