Deposition of a-Si: H Films with High Stability against Light Exposure by Reducing Deposition of Nanoparticles Formed in SiH4 Discharges

Industrial Plasma Technology: Applications from Environmental to Energy Technologies

Volumn , Issue , 2010, Pages 247-257

  Koga, Kazunori ^a   Shiratani, Masaharu ^a   Watanabe, Yukio ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Amorphous silicon; Defect density; Light induced degradation; Multihollow discharge plasma; Nanoparticles; Silane discharge

Indexed keywords

EID: 84864854320     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1002/9783527629749.ch20     Document Type: Chapter

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