Species responsible for Si-H2 bond formation in a-Si:H films deposited using silane high frequency discharges

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 17-21

  Shiratani, Masaharu ^a   Koga, Kazunori ^a   Kaguchi, Naoto ^a   Bando, Kouki ^a   Watanabe, Yukio ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

a Si:H; Cluster; Plasma CVD; SiH2

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONCENTRATION (PROCESS); DIODES; PLASMAS; THIN FILMS;

BOND CONCENTRATION; CLUSTER; PLASMA CVD;

SILANES;

EID: 33645218242     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.015     Document Type: Conference Paper

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