N-type perylene to fill voids in solution processed nanoparticulate zinc oxide thin films

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 44, Issue 10, 2012, Pages 2124-2127

  Bubel, Simon ^a,b,d   Ringk, Andreas ^b,c   Strohriegl, Peter ^c   Schmechel, Roland ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

^b DUTCH POLYMER INSTITUTE DPI   (Netherlands)

^c UNIVERSITY OF BAYREUTH   (Germany)

^d UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CONDUCTING; FUNCTIONALIZED; HIGH SURFACE-TO-VOLUME RATIO; METAL OXIDES; NANO PARTICULATES; NANO-PARTICLE DISPERSIONS; ORGANIC MOLECULES; PERYLENEDIIMIDES; PERYLENES; PRINTED ELECTRONICS; PRINTING TECHNOLOGIES; SOLUTION-PROCESSED; SURFACE ADSORBATES; ZINC OXIDE (ZNO); ZINC OXIDE THIN FILMS;

ADSORBATES; ELECTRIC PROPERTIES; FIELD EFFECT TRANSISTORS; GATE DIELECTRICS; IONIC LIQUIDS; NANOPARTICLES; POLYCYCLIC AROMATIC HYDROCARBONS; PRINTING; ZINC OXIDE;

THIN FILMS;

EID: 84864620417     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2012.06.027     Document Type: Article

References (37)

1. D.C. Olson, S.E. Shaheen, R.T. Collins, and D.S. Ginley Journal of Physical Chemistry C 111 44 2007 16670 10.1021/jp0734225 (Pubitemid 350150009)
2. F.C. Krebs Organic Electronics 10 5 2009 761 10.1016/j.orgel.2009.03.009
3. X. Bulliard, S.G. Ihn, S. Yun, Y. Kim, D. Choi, J.Y. Choi, M. Kim, M. Sim, J.H. Park, W. Choi, and K. Cho Advanced Functional Materials 20 24 2010 4381 10.1002/adfm.201000960
4. A. Wadeasa, G. Tzamalis, P. Sehati, O. Nur, M. Fahlman, M. Willander, M. Berggren, and X. Crispin Chemical Physics Letters 490 4-6 2010 200 10.1016/j.cplett.2010.03.050
5. T.W. Kim, D.C. Choo, Y.S. No, W.K. Choi, and E.H. Choi Applied Surface Science 253 4 2006 1917 10.1016/j.apsusc.2006.03.032 (Pubitemid 44791556)
6. Y. Tomita, C. May, M. Toerker, J. Amelung, M. Eritt, F. Loeffler, C. Luber, K. Leo, K. Walzer, K. Fehse, and Q. Huang Applied Physics Letters 91 6 2007 063510 10.1063/1.2768865 (Pubitemid 47247205)
7. R. Theissmann, S. Bubel, M. Sanlialp, C. Busch, G. Schierning, and R. Schmechel Thin Solid Films 519 2011 5623 10.1016/j.tsf.2011.02.073
8. J. Tellier, D. Kuscer, B. Malic, J. Cilensek, M. Skarabot, J. Kovac, G. Goncalves, I. Musevic, and M. Kosec Thin Solid Films 518 18 2010 5134 10.1016/j.tsf.2010.03.010
9. S.T. Meyers, J.T. Anderson, C.M. Hung, J. Thompson, J.F. Wager, and D.A. Keszler Journal of the American Chemical Society 130 51 2008 17603 10.1021/ja808243k
10. S. Bubel, N. Mechau, H. Hahn, and R. Schmechel Journal of Applied Physics 108 12 2010 124502 10.1063/1.3524184
11. S. Bubel, N. Mechau, and R. Schmechel Journal of Materials Science 46 24 2011 7776 10.1007/s10853-011-5757-4
12. M. Ali, and M. Winterer Chemistry of Materials 22 1 2010 85 10.1021/cm902240c
13. B.B. Claflin Surface Science 605 9-10 2011 859 10.1016/j.susc.2011.02.008
14. H. Faber, M. Burkhardt, A. Jedaa, D. Kalblein, H. Klauk, and M. Halik Advanced Materials 21 30 2009 3099 10.1002/adma.200900440
15. J.I. Sohn, W.-K. Hong, M.J. Lee, T. Lee, H. Sirringhaus, D.J. Kang, and M.E. Welland Nanotechnology 20 50 2009 505202 10.1088/0957-4484/20/50/505202
16. W.I. Park, J.S. Kim, G.C. Yi, M.H. Bae, and H.J. Lee Applied Physics Letters 85 21 2004 5052 10.1063/1.1821648 (Pubitemid 40715211)
17. C. Yang, Y. Kwack, S.H. Kim, T.K. An, K. Hong, S. Nam, M. Park, W.S. Choi, and C.E. Park Organic Electronics 12 3 2011 411 10.1016/j.orgel.2010.12. 008
18. A.S. Komolov, P.J. Moller, J. Mortensen, S.A. Komolov, and E.F. Lazneva Surface Science 586 1-3 2005 129 10.1016/j.susc.2005.05.006 (Pubitemid 40833821)
19. C.A. Aguilar, R. Haight, A. Mavrokefalos, B.A. Korgel, and S.C. Chen Acs Nano 3 10 2009 3057 10.1021/nn900777k
20. J.D. Prades, F. Hernandez-Ramirez, R. Jimenez-Diaz, M. Manzanares, T. Andreu, A. Cirera, A. Romano-Rodriguez, and J.R. Morante Nanotechnology 19 46 2008 465501 10.1088/0957-4484/19/46/465501
21. H. Nakanotani, M. Yahiro, C. Adachi, and K. Yano Applied Physics Letters 90 26 2007 262104 10.1063/1.2752023 (Pubitemid 47141107)
22. B.N. Pal, P. Trottman, J. Sun, and H.E. Katz Advanced Functional Materials 18 12 2008 1832 10.1002/adfm.200701430
23. S. Dutta, S.D. Lewis, and A. Dodabalapur Applied Physics Letters 98 21 2011 213504 10.1063/1.3583594
24. S.P. Singh, Z.E. Ooi, S.N.L. Geok, G.K.L. Goh, and A. Dodabalapur Applied Physics Letters 98 7 2011 073302 10.1063/1.3553191
25. S. Bubel, D. Nikolova, N. Mechau, and H. Hahn Journal of Applied Physics 105 6 2009 064514 10.1063/1.3097754
26. N. Mechau, S. Bubel, D. Nikolova, and H. Hahn Physica Status Solidi A 207 7 2010 1684 10.1002/pssa.200983768
27. J. Hirschmann, H. Faber, and M. Halik Nanoscale 4 2 2012 444 10.1039/c2nr11589a
28. S. Walther, S. Schafer, M.P.M. Jank, H. Thiem, W. Peukert, L. Frey, and H. Ryssel Microelectronic Engineering 87 11 2010 2312 10.1016/j.mee.2010.03.009
29. H. Faber, M. Klaumunzer, M. Voigt, D. Galli, B.F. Vieweg, W. Peukert, E. Spiecker, and M. Halik Nanoscale 3 3 2011 897 10.1039/c0nr00800a
30. S. Bubel, R. Schmechel, Microelectronic Engineering 96 (2012) 36-39, 〈 10.1016/j.mee.2012.02.044 〉.
31. B.A. Jones, A. Facchetti, M.R. Wasielewski, and T.J. Marks Journal of the American Chemical Society 129 49 2007 15259 10.1021/ja075242e (Pubitemid 350247810)
32. H.Z. Chen, M.M. Ling, X. Mo, M.M. Shi, M. Wang, and Z. Bao Chemistry of Materials 19 4 2007 816 10.1021/cm062352w (Pubitemid 46408950)
33. Y. Li, L. Tan, Z.H. Wang, H.L. Qian, Y.B. Shi, and W.P. Hu Organic Letters 10 4 2008 529 10.1021/ol703046w
34. S. Demmig, and H. Langhals Chemische Berichte 121 2 1988 225 10.1002/cber.19881210205
35. M.T. Greiner, M.G. Helander, W.-M. Tang, Z.-B. Wang, J. Qiu, and Z.-H. Lu Nature Materials 11 1 2012 76 10.1038/nmat3159
36. M.W. Allen, C.H. Swartz, T.H. Myers, T.D. Veal, C.F. McConville, S.M. Durbin, Physical Review B 81 (7) (2010) 075211 〈 10.1103/PhysRevB.81.075211 〉.
37. H.H. Hsieh, T. Kamiya, K. Nomura, H. Hosono, and C.C. Wu Applied Physics Letters 92 13 2008 133503 10.1063/1.2857463 (Pubitemid 351483707)