-
1
-
-
79957994061
-
-
10.1016/j.tsf.2011.02.073
-
R. Theissmann, S. Bubel, M. Sanlialp, C. Busch, G. Schierning, and R. Schmechel Thin Solid Films 519 2011 5623 5628 10.1016/j.tsf.2011.02.073
-
(2011)
Thin Solid Films
, vol.519
, pp. 5623-5628
-
-
Theissmann, R.1
Bubel, S.2
Sanlialp, M.3
Busch, C.4
Schierning, G.5
Schmechel, R.6
-
2
-
-
67849106925
-
-
10.1021/ja808243k
-
S.T. Meyers, J.T. Anderson, C.M. Hung, J. Thompson, J.F. Wager, and D.A. Keszler Journal of the American Chemical Society 130 51 2008 17603 17609 10.1021/ja808243k
-
(2008)
Journal of the American Chemical Society
, vol.130
, Issue.51
, pp. 17603-17609
-
-
Meyers, S.T.1
Anderson, J.T.2
Hung, C.M.3
Thompson, J.4
Wager, J.F.5
Keszler, D.A.6
-
3
-
-
77952991479
-
-
10.1143/JJAP.49.05EB02
-
K. Song, Y. Jeong, T. Jun, C.Y. Koo, D. Kim, K. Woo, A. Kim, J. Noh, S. Cho, and J. Moon Japanese Journal of Applied Physics 49 5 2010 05EB02 10.1143/JJAP.49.05EB02
-
(2010)
Japanese Journal of Applied Physics
, vol.49
, Issue.5
-
-
Song, K.1
Jeong, Y.2
Jun, T.3
Koo, C.Y.4
Kim, D.5
Woo, K.6
Kim, A.7
Noh, J.8
Cho, S.9
Moon, J.10
-
4
-
-
67649252663
-
-
10.1002/adma.200803584
-
A. Bashir, P.H. Wobkenberg, J. Smith, J.M. Ball, G. Adamopoulos, D.D.C. Bradley, and T.D. Anthopoulos Advanced Materials 21 21 2009 2226 10.1002/adma.200803584
-
(2009)
Advanced Materials
, vol.21
, Issue.21
, pp. 2226
-
-
Bashir, A.1
Wobkenberg, P.H.2
Smith, J.3
Ball, J.M.4
Adamopoulos, G.5
Bradley, D.D.C.6
Anthopoulos, T.D.7
-
5
-
-
79952634900
-
-
10.1039/c0nr00800a
-
H. Faber, M. Klaumunzer, M. Voigt, D. Galli, B.F. Vieweg, W. Peukert, E. Spiecker, and M. Halik Nanoscale 3 3 2011 897 899 10.1039/c0nr00800a
-
(2011)
Nanoscale
, vol.3
, Issue.3
, pp. 897-899
-
-
Faber, H.1
Klaumunzer, M.2
Voigt, M.3
Galli, D.4
Vieweg, B.F.5
Peukert, W.6
Spiecker, E.7
Halik, M.8
-
6
-
-
51349139857
-
-
10.1063/1.2972121
-
K. Okamura, N. Mechau, D. Nikolova, and H. Hahn Applied Physics Letters 93 8 2008 083105 10.1063/1.2972121
-
(2008)
Applied Physics Letters
, vol.93
, Issue.8
, pp. 083105
-
-
Okamura, K.1
Mechau, N.2
Nikolova, D.3
Hahn, H.4
-
8
-
-
77955511744
-
-
10.1016/j.mee.2010.03.009
-
S. Walther, S. Schafer, M.P.M. Jank, H. Thiem, W. Peukert, L. Frey, and H. Ryssel Microelectronic Engineering 87 11 2010 2312 2316 10.1016/j.mee.2010. 03.009
-
(2010)
Microelectronic Engineering
, vol.87
, Issue.11
, pp. 2312-2316
-
-
Walther, S.1
Schafer, S.2
Jank, M.P.M.3
Thiem, H.4
Peukert, W.5
Frey, L.6
Ryssel, H.7
-
9
-
-
78650895155
-
-
10.1063/1.3524184
-
S. Bubel, N. Mechau, H. Hahn, and R. Schmechel Journal of Applied Physics 108 12 2010 124502 10.1063/1.3524184
-
(2010)
Journal of Applied Physics
, vol.108
, Issue.12
, pp. 124502
-
-
Bubel, S.1
Mechau, N.2
Hahn, H.3
Schmechel, R.4
-
10
-
-
63749118039
-
-
10.1063/1.3097754
-
S. Bubel, D. Nikolova, N. Mechau, and H. Hahn Journal of Applied Physics 105 6 2009 064514 10.1063/1.3097754
-
(2009)
Journal of Applied Physics
, vol.105
, Issue.6
, pp. 064514
-
-
Bubel, S.1
Nikolova, D.2
Mechau, N.3
Hahn, H.4
-
11
-
-
0033798279
-
-
10.1021/cm9907817
-
L. Guo, S.H. Yang, C.L. Yang, P. Yu, J.N. Wang, W.K. Ge, and G.K.L. Wong Chemistry of Materials 12 8 2000 2268 2274 10.1021/cm9907817
-
(2000)
Chemistry of Materials
, vol.12
, Issue.8
, pp. 2268-2274
-
-
Guo, L.1
Yang, S.H.2
Yang, C.L.3
Yu, P.4
Wang, J.N.5
Ge, W.K.6
Wong, G.K.L.7
-
12
-
-
0038653186
-
-
10.1063/1.126511
-
L. Guo, S.H. Yang, C.L. Yang, P. Yu, J.N. Wang, W.K. Ge, and G.K.L. Wong Applied Physics Letters 76 20 2000 2901 2903 10.1063/1.126511
-
(2000)
Applied Physics Letters
, vol.76
, Issue.20
, pp. 2901-2903
-
-
Guo, L.1
Yang, S.H.2
Yang, C.L.3
Yu, P.4
Wang, J.N.5
Ge, W.K.6
Wong, G.K.L.7
-
13
-
-
0004005306
-
-
third ed., Wiley, ISBN-13: 978-0471143239
-
S.M. Sze, N.K. Kwok, Physics of Semiconductor Devices, third ed., Wiley, 2007, ISBN-13: 978-0471143239.
-
(2007)
Physics of Semiconductor Devices
-
-
Sze, S.M.1
Kwok, N.K.2
-
14
-
-
77956867711
-
-
10.1039/c0jm00185f
-
K. Okamura, D. Nikolova, N. Mechau, and H. Hahn Journal of Materials Chemistry 20 27 2010 5651 5658 10.1039/c0jm00185f
-
(2010)
Journal of Materials Chemistry
, vol.20
, Issue.27
, pp. 5651-5658
-
-
Okamura, K.1
Nikolova, D.2
Mechau, N.3
Hahn, H.4
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