Effect of the thickness of reactively sputtered WO 3 submicron thin films used for NO 2 detection

Sensors and Actuators, B: Chemical

Volumn 171-172, Issue , 2012, Pages 18-24

  Hemberg, A ^a,b   Konstantinidis, S ^b   Viville, P ^a   Renaux, F ^b   Dauchot, J P ^a   Llobet, E ^c   Snyders, R ^a,b  

^a MATERIA NOVA RESEARCH CENTER   (Belgium)

^b UNIVERSITY OF MONS   (Belgium)

^c UNIVERSITAT ROVIRA I VIRGILI   (Spain)

Author keywords

Chemical sensor; Reactive magnetron sputtering; Sensing properties; Thin films; Tungsten trioxide

Indexed keywords

CHEMICAL COMPOSITIONS; GAS SENSING CHARACTERISTICS; GAS SENSING PROPERTIES; GRAIN SIZE; MONOCLINIC PHASE; PREFERENTIAL ORIENTATION; REACTIVE MAGNETRON SPUTTERING; RECOVERY TIME; SENSING PROPERTY; SUB-MICRON THIN FILMS; TUNGSTEN TRIOXIDE;

ATOMIC FORCE MICROSCOPY; CHEMICAL DETECTION; CHEMICAL SENSORS; GAS DETECTORS; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; NITROGEN OXIDES; PHOTOELECTRONS; THICK FILMS; THIN FILMS; TUNGSTEN; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM THICKNESS;

EID: 84864290391     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2012.03.037     Document Type: Review

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