Tungsten trioxide (WO3) sputtered thin films for a NOx gas sensor

Sensors and Actuators, B: Chemical

Volumn 50, Issue 1, 1998, Pages 9-18

  Penza, M ^a   Tagliente, M A ^a,b   Mirenghi, L ^a   Gerardi, C ^a   Martucci, C ^a   Cassano, G ^a,c  

^a Centro Nazionale per la Ricerca e lo Sviluppo dei Materiali   (Italy)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

^c CNR   (Italy)

Author keywords

NOx gas sensor; WO3 thin films

Indexed keywords

ELECTRIC CURRENT MEASUREMENT; ELECTRIC RESISTANCE; FILM GROWTH; GLASS; NITROGEN OXIDES; SECONDARY ION MASS SPECTROMETRY; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

TUNGSTEN TRIOXIDE SPUTTERED THIN FILMS;

CHEMICAL SENSORS;

EID: 0032119866     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(98)00149-X     Document Type: Article

References (15)

1. V. Demarne, R. Sanjines, Thin film semiconducting metal oxide gas, sensors, in: G. Sberveglieri (Ed.), Gas Sensors, Kluwer, Dordrecht, 1992, pp. 89-116.
2. P. Nelli, G. Sberveglieri, Semiconducting thin film gas sensors: theory, in: A. D'Amico, G. Sberveglieri (Eds.), Sensors for Domestic Applications, Proceedings of the First European School on Sensors (ESS '94), World Scientific, Singapore, 1995, pp. 37-48.
3. G. Sberveglieri, Recent developments in semiconducting thin film gas sensors, Sensors and Actuators B 23 (1995) 103-109.
4. x monitoring, Sensors and Actuators B 26-27 (1995) 89-92.
5. N. Yamazoe, N. Miura, New approaches in the design of gas sensors, in: G. Sberveglieri (Ed.), Gas Sensors, Kluwer, Dordrecht, 1992, pp. 1-42.
6. D.J. Smith, J.F. Vetelino, R.S. Falconer, E.L. Wittman, Stability, sensitivity and selectivity of tungsten trioxide films for sensing applications, Sensors and Actuators B 13-14 (1993) 264-268.
7. 2 sensor, Technical Digest of Fifth International Meeting on Chemical Sensors, IMCS'94, Rome, 11-14 July, 1994, Vol. 1, pp. 490-493.
8. 3 thin films obtained by high vacuum thermal evaporation, in: C. Di Natale, A. D'Amico (Eds.), Proceedings of the First Italian Conference, World Scientific, Singapore, 1996, pp. 131-135
9. 2 sensors based on nanosized thin films of titanium-tungsten oxides, Sensors and Actuators B 31 (1996) 89-92.
10. 3 thin-film sensitive coating, Sensors and Actuators B 41 (1997) 31-36.
11. J.F. Vetelino, R.K. Lade, R.S. Falconer, Hydrogen sulfide surface acoustic wave gas detector, IEEE Trans. Ultrason. Ferroelectr. Freq. Control 34 (2) (1987) 156-161.
12. R.S. Falconer, J.F. Vetelino, D.J. Smith, M.J. Osborn, An activated process for increased sensitivity of a SAW gas microsensor, IEEE Ultrason. Symp. Proc., 1990, Vol. 2, pp. 315-318.
13. M. Penza, C. Martucci, V.I. Anisimkin, L. Vasanelli, Deposition of doped and undoped ZnO thin films for gas sensors, Mater. Sci. Forum 203 (1996) 137-142.
14. 2S-sensitive tungsten oxide films, Sensors and Actuators B 31 (1996) 167-174.
15. W. Göpel, K.D. Schierbaum, Electronic conductance and capacitance sensors, in: W. Gopel, J. Hesse, J.N. Zemel (Eds.), Sensors, Chemical and Biochemical Sensors, vol. 2, VCH, Weinheim, 1991, pp. 429-466.