The influence of air and vacuum thermal treatments on the NO2 gas sensitivity of WO3 thin films prepared by thermal evaporation

Thin Solid Films

Volumn 391, Issue 2, 2001, Pages 224-228

  Lozzi, L ^a   Ottaviano, L ^a   Passacantando, M ^a   Santucci, S ^a,b   Cantalini, C ^a  

^a UNIVERSITY OF L'AQUILA   (Italy)

^b INFM   (Italy)

Author keywords

Electrical properties and measurements; Photoelectron spectroscopy (PES); Sensors; Tungsten oxide

Indexed keywords

AIR; ANNEALING; EVAPORATION; PHOTOELECTRON SPECTROSCOPY; SILICON; SILICON NITRIDE; THIN FILMS; TUNGSTEN COMPOUNDS; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ULTRAHIGH VACUUM THERMAL TREATMENTS;

CHEMICAL SENSORS;

EID: 0035898883     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)00986-5     Document Type: Conference Paper

References (20)

1. Development of high sensitivity NO sensor using metal oxides