Catalytic activity of noble metals for metal-assisted chemical etching of silicon

Nanoscale Research Letters

Volumn 7, Issue , 2012, Pages

  Yae, Shinji ^a   Morii, Yuma ^a   Fukumuro, Naoki ^a   Matsuda, Hitoshi ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Anodic dissolution of silicon; Displacement deposition; Electrochemical catalysts; Electroless plating; Etching of semiconductor; Galvanic etching; Metal nanoparticles; Overpotential; Oxygen reduction; Porous silicon

Indexed keywords

CATALYST ACTIVITY; DISSOLUTION; DISSOLVED OXYGEN; ELECTROLESS PLATING; ELECTROLYTIC REDUCTION; ETCHING; HYDROFLUORIC ACID; METAL NANOPARTICLES; OXIDATION; PLATINUM;

ANODIC DISSOLUTION; ELECTROCHEMICAL CATALYST; GALVANIC ETCHING; OVERPOTENTIAL; OXYGEN REDUCTION;

POROUS SILICON;

EID: 84864023012     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-7-352     Document Type: Article

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